2007
DOI: 10.1007/s00339-007-4278-0
|View full text |Cite
|
Sign up to set email alerts
|

Computational modeling of forced flow laser chemical vapor deposition

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2013
2013
2020
2020

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 5 publications
(2 citation statements)
references
References 16 publications
0
2
0
Order By: Relevance
“…Thus, for each precursor, the process conditions should be carefully evaluated, to provide a reasonable MTL range and optimized growth rates. Finally, as has been previously suggested, 54,55 increasing the laser power (Q L ) to compensate for temperature losses can also help maintain operation within the MTL regime over an extended range of flow rates, allowing for even greater convective growth rate enhancements.…”
Section: Growth Simulation (Rate Versus Gas Velocity)mentioning
confidence: 92%
“…Thus, for each precursor, the process conditions should be carefully evaluated, to provide a reasonable MTL range and optimized growth rates. Finally, as has been previously suggested, 54,55 increasing the laser power (Q L ) to compensate for temperature losses can also help maintain operation within the MTL regime over an extended range of flow rates, allowing for even greater convective growth rate enhancements.…”
Section: Growth Simulation (Rate Versus Gas Velocity)mentioning
confidence: 92%
“…The heat transfer model is therefore an effective tool for obtaining temperature profiles in laser applications [14,[17][18][19]. For example, in modelling laser chemical vapor deposition (LCVD) [20,21], temperature evolution could be simulated considering the forced convection air flow [22,23] and the effect of natural convection for both stationary and moving laser [24,25]. However, most studies of laser induced deposition focused on the reactions in a vacuum or gas based environment.…”
Section: Introductionmentioning
confidence: 99%