2021
DOI: 10.1039/d1ra00397f
|View full text |Cite
|
Sign up to set email alerts
|

Nucleation of diamond films on heterogeneous substrates: a review

Abstract: Growth of diamond film on heterogeneous substrates assisted by nucleation/seeding.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
28
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
4
4

Relationship

2
6

Authors

Journals

citations
Cited by 68 publications
(28 citation statements)
references
References 229 publications
0
28
0
Order By: Relevance
“…In our synthesis, the Si nanocrystals clearly act as seeds, in parallel to the seeded growth of nanodiamond layers. [46] However, as is evident from Table 3, the Si-originating PL undergoes a blueshift in the initial stages of the MMS treatment. This observation suggests that the seeding Si nanocrystals decrease their size to a small extent.…”
Section: Discussionmentioning
confidence: 82%
“…In our synthesis, the Si nanocrystals clearly act as seeds, in parallel to the seeded growth of nanodiamond layers. [46] However, as is evident from Table 3, the Si-originating PL undergoes a blueshift in the initial stages of the MMS treatment. This observation suggests that the seeding Si nanocrystals decrease their size to a small extent.…”
Section: Discussionmentioning
confidence: 82%
“…B-NCD films were grown in a Seki Diamond systems AX 6500 series MPCVD system. High resistivity float-zone Si substrates ( = 2", t = 500 µm) were first seeded using a nanodiamond colloid suspension [28,29] and grown at 3.5 kW at 40 Torr with a pyrometer measured substrate temperature of 755 • C for 3 hours. Deposition was achieved in a gas mixture of CH 4 , trimethylboron (TMB) dilute in H 2 in a total flow rate of 500 sccm (3% CH4 and B/C ratio ∼12,800 ppm) [30].…”
Section: Methodsmentioning
confidence: 99%
“…This is likely due to the holder significantly perturbing the resonant frequency of the chamber. The Si wafers were seeded using the ultrasonic seeding process [55,56]. Briefly, the wafers were solvent cleaned and placed in a nanodiamond colloidal solution with a particles of a positive zeta potential whilst under ultrasonic agitation for 10 minutes.…”
Section: Experimental Methodsmentioning
confidence: 99%