2021
DOI: 10.48550/arxiv.2111.10258
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Microwave plasma modelling in clamshell chemical vapour deposition diamond reactors

Jerome A. Cuenca,
Soumen Mandal,
Evan L. H. Thomas
et al.

Abstract: A microwave plasma model of a chemical vapour deposition (CVD) reactor is presented for understanding spatial heteroepitaxial growth of polycrystalline diamond on Si. This work is based on the TM 0(n>1)p clamshell style reactor (Seki Diamond/ASTEX SDS 6K, Carat CTS6U, ARDIS-100 style) whereby a simplified H 2 plasma model is used to show the radial variation in growth rate over small samples with different sample holders. The model uses several steps: an electromagnetic (EM) eigenfrequency solution, a frequenc… Show more

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“…The SEM images show that in the gap regions, the B-NCD has been successfully etched which was also corroborated using a probe station measurement. Raman spectra is given in Figure 4, showing the first and second order bands of Si at ∼520 cm −1 and ∼965 cm −1 , respectively [31,32,33] and numerous signatures typically associated with BDD at high dopant concentrations. The B-NCD bands are labelled at ∼450 cm −1 (dA), ∼1200 cm −1 (dC), ∼1295 cm −1 (dB), 1332 cm −1 (d) and the wide region at ∼1500-1680 cm −1 (G) [34].…”
Section: Resultsmentioning
confidence: 99%
“…The SEM images show that in the gap regions, the B-NCD has been successfully etched which was also corroborated using a probe station measurement. Raman spectra is given in Figure 4, showing the first and second order bands of Si at ∼520 cm −1 and ∼965 cm −1 , respectively [31,32,33] and numerous signatures typically associated with BDD at high dopant concentrations. The B-NCD bands are labelled at ∼450 cm −1 (dA), ∼1200 cm −1 (dC), ∼1295 cm −1 (dB), 1332 cm −1 (d) and the wide region at ∼1500-1680 cm −1 (G) [34].…”
Section: Resultsmentioning
confidence: 99%