Novel Process to Improve Defect Problems for Thermal Nanoimprint Lithography

Park, Hyung Seok; Shin, Ho Hyun; Sung, Man Young; Choi, Woo Beom; Choi, Seung Woo; Park, Sang Yong

doi:10.1109/tsm.2006.890315

Cited by 9 publications

(8 citation statements)

References 19 publications

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“…In nano-imprint process, due to the environment, materials, or processes, for example, air bubbles, the mold deformation, uneven coating, unparallel between the substrate and the mold, and so on, will produce a variety of defects [26][27]. How to control and avoid the emergence of various defects in imprint lithography and improve the quality of imprint pattern is therefore key issues.…”

Section: Defectmentioning

confidence: 99%

Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement

et al. 2011

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Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier.

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Section: Defectmentioning

confidence: 99%

Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement

et al. 2011

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“…Relatively low density in these regions may suggest that they may possibly be subjected to the occurrence of defects. Particularly, the reentrant corners are found to have low density and this is why incomplete patterns may be found in these regions [34].…”

Section: Adhesion: the Effect Of Self-assembly Monolayermentioning

confidence: 99%

Molecular simulation study on adhesions and deformations for Polymethyl Methacrylate (PMMA) resist in nanoimprint lithography

Kwon¹,

Lee²,

Park³

et al. 2011

J Mech Sci Technol

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The NIL (nanoimprint lithography) process is explored through numerical simulation, utilizing MD (molecular dynamics), with a focus on the resin deformations and the adhesion between the resin material and the tool. For the force-field of the Polymethyl Methacrylate (PMMA), used for the resin material, a united atom model is employed. For temperature control in the MD simulation, the recursive multiple chains of the Nosé-Poincaré thermostat is applied. The deformation and adhesion in the NIL process are explored from the mechanics viewpoint based on the present MD results. In particular, the adhesion behavior of a self-assembly monolayer (SAM) in the stamp-releasing stage is discussed in connection with the monolayer thickness.

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“…This method considers volumn of resist changes according to temperature and pressure. For polymer material, The relation of fractional free volume of resist and imprint temperature and pressure can be assumed as [9] :…”

Section: Temperature-pressure Variation Imprintmentioning

confidence: 99%

“…Several methods have been used to enhance the imprint quality, including air cushion press [7], soft press [8], Temperature-Pressure Variation [9], Electrostatic Force-Assisted [10], and Wafer Bowing [11], among which, Soft press and Temperature-Pressure Variation do not require add other functional part, so the above 2 methods are introduced. …”

Section: Introductionmentioning

confidence: 99%

Nano-patterns fabricated by soft press and temperature-pressure variation imprint

Wang

Zhang

et al. 2010

5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of M

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Nano-devices are increasingly required, the fabrication cost of nano-devices is quite high due to high resolution requirement. Nanoimprint lithography(NIL) is a promising technology for nano devices fabrication due to its low cost and high resolution. However, it still suffers from the large area uniformity and imprint defects problems. Herein, temperature-pressure variation soft press process are used in Simultaneous Thermal and UV (STU) imprint to enhance the uniformity and quality of pattern. This method is used to pattern high quality photonic crystals and gratings.

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Novel Process to Improve Defect Problems for Thermal Nanoimprint Lithography

Cited by 9 publications

References 19 publications

Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement

Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement

Molecular simulation study on adhesions and deformations for Polymethyl Methacrylate (PMMA) resist in nanoimprint lithography

Nano-patterns fabricated by soft press and temperature-pressure variation imprint

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