Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement

Abstract

Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier.

Micro‐/Nanostructured Interface for Liquid Manipulation and Its Applications

“…This method usually uses a microstructured soft polymeric stamp like polydimethylsiloxane (PDMS) or mold that imprint ink onto substrate to generate surface patterns with feature sizes ranging from 30 nm to 10 µm . Many techniques are known as soft lithography, including microcontact printing, nanoimprint lithography, microtransfer molding, replica molding, solvent‐assisted micromolding, micromolding in capillaries, etc. The schematic diagram of the frequently used soft lithography techniques are illustrated in Figure b.…”

Synthesis of Hollow Silica Particles Using Acid Dissolvable Resorcinol‐Formaldehyde Resin Particles as Template

“…Since numerous pores can be generated on the silica shell by the gas released during RF decomposition, the HSPs prepared by calcination possess a higher BET surface area than that obtained by acid washing (298.2 vs. 128.1 m 2 g −1 ) . However, compared to the HSPs prepared thorough the template dissolving process, the later value is comparable or even larger, indicating the acid‐washing method is effective in constructing porous HSPs ,,,. The reason may be due to that in this method, the RF synthesizing and silica coating are conducted in a one‐pot manner, and some unreacted RF oligomers in the solution could incorporate into the silica layer and serve as the porogen, leading to a relative large surface area of the HSPs.…”

“…to scale‐up . In addition, for the polymeric templates, the template removal via a solvent dissolving route is usually more desirable than calcination, since the calcination treatment requires longer time, additional equipment and sometimes may lead to sintering of the HSPs .…”

Ordered arrays of pumpkin-shaped Janus particles with tailored surface morphologies via microcontact hot embossing

“…It is known that nanoimprint lithography is a superior topdown approach for micro/nanofabrication [21], which is mainly based on hot embossing lithography, ultraviolet nanoimprint lithography, and soft lithography (e.g., microcontact printing (μCP)) [22]. Those techniques provide us a novel perspective for the post-modification of particles in a simple way, while concerned researches are limited.…”