Novel Photosensitive Transparent Heat Stable Coatings

Suwa, Mitsuhiro; Fujikawa, Takanori; Okazaki, Toru; Araki, Hiroshi

doi:10.2494/photopolymer.24.259

Cited by 4 publications

(3 citation statements)

References 1 publication

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“…In addition, this layer requires high transparency, good light resistance, and patternability to form a wiring connection area for application to image displays. Previously, we developed siloxane with a high transparency and high light resistance [3][4][5], and recently, we mass-produced functional composite materials with positive-tone photosensitive siloxane and inorganic filler [6]. In this paper, we introduce novel coatings composed of positive-tone photosensitive siloxane and a light-diffusion filler (TiO 2 or ZrO 2 ).…”

Section: Introductionmentioning

confidence: 99%

Development of Photo-sensitive Siloxane Coatings with High Light-diffusion

Kobayashi

Fukuzaki

Suwa

2020

J. Photopol. Sci. Technol.

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New self-luminous displays such as organic light-emitting diode and micro light-emitting diode devices are attracting increasing attention. Moreover, many researchers are working to improve the light extraction efficiency of these devices to increase the display brightness. Proposed light extraction methods include refractive index control layers, controlled surface texture structures, and light-diffusion layers. Of these, our focus was on the light-diffusion layer, which requires suitable light diffusion, high transparency, high light resistance, and patternability for forming wiring connection areas. In this paper, we introduce novel photosensitive siloxane coatings using positive-tone photosensitive siloxane and a lightdiffusion filler (TiO2 or ZrO 2). These coatings control the haze value in the range of 5% to 72% in the form of a thin film (1 µm). In addition, the films have a high transparency, good light resistance, and appropriate patternability. Therefore, these photosensitive siloxane coatings with light-diffusion properties are suitable for new self-luminous displays.

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Section: Introductionmentioning

confidence: 99%

Development of Photo-sensitive Siloxane Coatings with High Light-diffusion

Kobayashi

Fukuzaki

Suwa

2020

J. Photopol. Sci. Technol.

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“…Another benefit that can be gained from an easily coatable SSQ sol is that extra functions can be introduced into the material. One of the most attractive functions is photosensitivity . Photo exposure to a thin film that consists of properly formulated SSQs and photoactive compounds yields silicon‐containing small patterns after development.…”

Section: Introductionmentioning

confidence: 99%

“…Both positive‐ and negative‐tone SSQ photoresists have been studied . Loading of Diazonaphthoquinone (DNQ) derivatives give a positive‐tone photoresist . Negative‐tones can be created by loading SSQs with photo acid generators (PAGs) or photo radical initiators …”

Section: Introductionmentioning

confidence: 99%

Styryl silsesquioxane photoresist

Sugita

Tanaka

Shirato

et al. 2014

J of Applied Polymer Sci

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There is a substantial need for photopattern-able, heat resistant, and transparent materials that are applicable to electronic devices, such as imaging or display elements. Styryl silsesquioxane based photoresist forms thin micro patterns after i-line exposure and alkaline development, and the resulting transparent film shows remarkable heat resistance. Radicals generated from a photoinitiator induce polymerization of styryl functionality in the photoresist film to form the micropatterns.

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