Styryl silsesquioxane photoresist

Abstract

There is a substantial need for photopattern-able, heat resistant, and transparent materials that are applicable to electronic devices, such as imaging or display elements. Styryl silsesquioxane based photoresist forms thin micro patterns after i-line exposure and alkaline development, and the resulting transparent film shows remarkable heat resistance. Radicals generated from a photoinitiator induce polymerization of styryl functionality in the photoresist film to form the micropatterns.

Improvement of the photopolymerization and bottom-curing performance of benzocarbazole oxime ester photoinitiators with red-shifted absorption

“…Actually, these photoinitiators are widely utilized in the field of photolithography using the i-line. [22][23][24][25][26] PI-3, which has a trimethylbenzoylbenzocarbazole-substituted oxime moiety as the chromophore and an acetyl group in the ester part, is a recently developed photoinitiator for advanced processing.…”

Recent advances on carbazole-based oxime esters as photoinitiators of polymerization

“…[247] Interestingly, OXE-02 displayed an outstandingly high sensitivity in resins containing black pigments so that OXE-02 was immediately commercialized by the color filter resist manufacturers. [248][249][250][251][252][253] Noticeably, only one initiating and reactive species is formed by photodecomposition of OXE-02. Indeed, iminyl radicals formed in first step cannot undergo a further fragmentation, furnishing radicals unable to add onto acrylic double bonds.…”