2018
DOI: 10.1109/ted.2018.2862409
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Novel Nanofabricated Mo Field-Emitter Array for Low-Cost and Large-Area Application

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Cited by 12 publications
(8 citation statements)
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“…On this basis, focus has been given to the study of field emission (FE) behavior of different types of one-dimensional (1-D) nanostructured materials in both array and nonarray form (Table S1 in the Supporting Information). Promising one-dimensional field emitters include carbon nanotubes, Mo, W, and semiconductors such as ZnO, TiO 2 , SnO 2 , WO 3 , etc. Several factors such as morphology (e.g., whiskerlike structure of CNTs), low work function, high melting point, high chemical stability, uniformity in a stable emission current, and ease of synthesis control the efficiency and applicability of a field emitter.…”
Section: Introductionmentioning
confidence: 99%
“…On this basis, focus has been given to the study of field emission (FE) behavior of different types of one-dimensional (1-D) nanostructured materials in both array and nonarray form (Table S1 in the Supporting Information). Promising one-dimensional field emitters include carbon nanotubes, Mo, W, and semiconductors such as ZnO, TiO 2 , SnO 2 , WO 3 , etc. Several factors such as morphology (e.g., whiskerlike structure of CNTs), low work function, high melting point, high chemical stability, uniformity in a stable emission current, and ease of synthesis control the efficiency and applicability of a field emitter.…”
Section: Introductionmentioning
confidence: 99%
“…One of the most widespread methods is reactive ion etching (RIE), mainly used to shrink colloidal particles so as to turn a closely packed arrangement into a non-closely packed pattern [3,[9][10][11]. Using RIE-reduced particles as a mask for metal deposition, one can obtain, for instance, a metal mesh with circular holes, whereas, with the originally closely-packed arrangement, only nearly triangular islands (corresponding to the interstices between closely-packed patterns) would be feasible [4,5].…”
Section: Introductionmentioning
confidence: 99%
“…The direct electron‐beam lithography (EBL) [ 54 ] could enable coplanar geometrically asymmetric nanostructure but compromise significant limitations in terms of low‐throughput, poor scalability to large area and rough boundaries. Here, a novel fabrication process developed from our reported technique [ 55–57 ] is demonstrated to fabricate coplanar asymmetric tip‐to‐edge metal nanostructure with sub‐10 nm air channel and different tip‐to‐edge height. Figure S2, Supporting Information presents step‐by‐step fabrication details.…”
Section: Resultsmentioning
confidence: 99%