2007 IEEE Symposium on VLSI Technology 2007
DOI: 10.1109/vlsit.2007.4339743
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Novel Lithography-Independent Pore Phase Change Memory

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Cited by 108 publications
(66 citation statements)
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“…We have used one of the conventional cell structures used by many other research groups (30,31). The pulse width needed to switch the cells via a single pulse using our present cell was found to be several tens of nanoseconds (depending on the voltage applied; SI Appendix, Fig.…”
Section: Methodsmentioning
confidence: 99%
“…We have used one of the conventional cell structures used by many other research groups (30,31). The pulse width needed to switch the cells via a single pulse using our present cell was found to be several tens of nanoseconds (depending on the voltage applied; SI Appendix, Fig.…”
Section: Methodsmentioning
confidence: 99%
“…Therefore ∆S for the lower SiGe-TiN interface becomes negative as shown by the red arrows in the inset of Fig 7(a). This results in an opposite Peltier effect at the SiGe-TiN interface in the direction of current flow (6), which will in turn result in an enhanced cooling. This will make the region a good heat sink, thereby reducing the Peltier heating effect of the GST-SiGe layer due to the closer proximity with SiGe-TiN interface.…”
Section: Effect Of Varying Sige Layer Thicknessmentioning
confidence: 99%
“…Design approaches to reduce programming currents are primarily geometry based [2,[5][6][7][8][9][10][11]. Apart from the typical mushroom cell geometry [2], the most common geometry variant is the vertical pillar structure [5,12,13], which may be typically fabricated using nanowires.…”
Section: Introductionmentioning
confidence: 99%
“…Usually, a very high current is required to generate an adequate energy to switch the cell, especially for RESET operations. To make PCM operate at CMOS compatible voltages, various cell structures have been developed to improve electrical-to-thermal efficiency through device geometry optimization [16,[22][23][24][25][26][27][28]. One effective approach has been to create sub-lithographic features to minimize the volume of the phase change material in the current path through the PCM storage element.…”
Section: Cell Structure: Pcm Storage Elementmentioning
confidence: 99%
“…The cross-sectional area between bottom electrical contact (BEC) and the phase change material layer is minimized to effectively confine the current to optimize heat generation. The sub-lithographic BEC in a mushroom cell can be formed by techniques such as the spacer process, resist trimming and the key-hole transfer process [30,31]. To further reduce the switching power requirements (RESET current), various material engineering techniques have been developed, including increasing the resistivity of either the electrode material or the phase change material and decreasing the thermal diffusion losses through the top and bottom electrode [33][34][35].…”
Section: Cell Structure: Pcm Storage Elementmentioning
confidence: 99%