2009
DOI: 10.1002/adma.200803865
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Nonuniform Nanowire Doping Profiles Revealed by Quantitative Scanning Photocurrent Microscopy

Abstract: Scanning photocurrent microscopy (SPCM) is used in semiconductor nanowire devices to establish quantitative potential profiles correlated with nonuniformities in electrical resistivity. Surface doping leads to a nonuniform axial photocurrent (a). Surface etching improves the uniformity of the local photocurrent (b) and reduces the radial and axial carrier concentration gradients (c, blue curve after etching).

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Cited by 114 publications
(149 citation statements)
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References 32 publications
(48 reference statements)
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“…This calculation indicates that the surface dopant concentration is enriched in the larger diameter n-Si NWs, although the NW FETs still behave as a heavily doped depletion mode devices after removal of this surface layer. The similar dopant surface segregation in an Ϸ60-nm diameter NWs has been reported recently on the basis of scanning photocurrent microscopy, transport measurement and atom probe tomography (19). In contrast, I-V g data recorded from devices with an Ϸ22-nm diameter single oxidation/etch and control NWs (Fig.…”
Section: Resultsmentioning
confidence: 88%
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“…This calculation indicates that the surface dopant concentration is enriched in the larger diameter n-Si NWs, although the NW FETs still behave as a heavily doped depletion mode devices after removal of this surface layer. The similar dopant surface segregation in an Ϸ60-nm diameter NWs has been reported recently on the basis of scanning photocurrent microscopy, transport measurement and atom probe tomography (19). In contrast, I-V g data recorded from devices with an Ϸ22-nm diameter single oxidation/etch and control NWs (Fig.…”
Section: Resultsmentioning
confidence: 88%
“…Direct experimental determination of dopant location in NWs is challenging, although there has been recent progress (17)(18)(19)(20)(21). For example, high-resolution secondary ion mass spectroscopy was used to probe for gold-impurities in m diameter Si wires with a depth resolution of Ϸ20 nm (17), and atom probe tomography has been used to investigate the distribution of impurity atoms in Si NWs with nanometer resolution (18,19). The vertical geometry needed for these latter measurements may, however, place limitations on growth conditions that yield NWs suitable for analysis.…”
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confidence: 99%
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“…Several experiments have probed the consequences of such defects on the spatial variation of photoresponse of nanostructures. [16,33,39,40,42,43] In these experiments, the effect of the defect is to create a local hill, or a valley, in the potential landscape. The photocarriers are generated in the same material that carries the charge carriers to the electrodes.…”
mentioning
confidence: 99%
“…We investigate the efficiency of these devices for photoconversion and attempt to understand the role of defects in modifying optoelectronic properties. [16] Prior to studying the hybrid devices, we probe individual WS 2 nanotubes and show that they offer a good optoelectronic platform. [17,18] We used WS 2 multiwalled * deshmukh@tifr.res.in † contributed equally nanotubes [8,19] obtained from NanoMaterials.…”
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confidence: 99%