2008
DOI: 10.1088/0022-3727/41/17/175105
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Nonalloyed ohmic contact formation in Ti/Al contacts to n-type AlGaN

Abstract: Nonalloyed ohmic contact formation in Ti/Al contacts to n-type AlGaN (n-AlGaN) was achieved in this study. The surface chemistry and electrical properties of n-AlGaN surfaces were studied via x-ray photoelectron spectroscopy before and after oxidation and wet chemical treatments. The authors found that changes in the contact resistance are dominated by changes in the Al mole fraction and the interface states. Oxidation and HF and (NH4)2Sx treatments on n-AlGaN led to an increase in the electron affinity (due t… Show more

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Cited by 4 publications
(7 citation statements)
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“…In this study, the Ni layer was designed to produce high reflectance because it has higher reflectance along with high work function than Ag. On the other hand, the Ag layer was used to reduce contact resistivity by increasing acceptors near the AlGaN surface region, [34][35][36] as will be discussed later (Fig. 8).…”
Section: Resultsmentioning
confidence: 99%
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“…In this study, the Ni layer was designed to produce high reflectance because it has higher reflectance along with high work function than Ag. On the other hand, the Ag layer was used to reduce contact resistivity by increasing acceptors near the AlGaN surface region, [34][35][36] as will be discussed later (Fig. 8).…”
Section: Resultsmentioning
confidence: 99%
“…This means that annealing caused the surface Fermi level to be shifted to the valence-band edge. 34,35,37 The formation of an Ag-Ga solid solution at the Ag/p-AlGaN interface after annealing 500 °C leads to the occurrence of acceptor-like Ga vacancies at the AlGaN surface region, 36,38,39 which can be responsible for the binding energy shift 34,35,37 and consequently reduce the Schottky barrier height at the Ag/p-AlGaN interface. This is also true for the Ni/Au-based contacts (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Based on the above experimental result, we can conclude that, as increases from 10.0 nm to 80.0 nm, the average size of the magnetic domains in the films goes up and the direction of the magnetization of the samples deviate from the in-plane reorientation gradually with the increase of the domain size. Since the direction of the tip magnetization is normal to the film surface, which is taken as the direction, the oscillation phase shift ∆ recorded as the magnetic force image is approximately represented by [2] ∆ ≈ − ,…”
Section: -2mentioning
confidence: 99%
“…It has also been shown that, because of the surface roughness of the film, the spins are easily pinned at 117501-3 the terraces or craters. [2] As a result, the magnetization fluctuation produces a rather inhomogeneous field along the domain walls. From the energy minimization point of view, the irregular magnetic domain structure should be dominated by the balance between the shape anisotropy and surface anisotropy of the film and then reduce the total free energy of the system.…”
Section: -2mentioning
confidence: 99%
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