2003
DOI: 10.1109/tnano.2003.820508
|View full text |Cite
|
Sign up to set email alerts
|

New insights in high-energy electron emission and underlying transport physics of nanocrystalline si

Abstract: Abstract-This paper presents quantitative analysis of electron emission from nanocrystalline Si dots, and discusses its mechanism based on the calculations of electronic and phononic states. Analysis of emission energy distribution measured from the vacuum level shows that the energy at the peak of the distribution increases linearly with increasing voltage applied across the nanocrystalline Si system. The slope of the linear law is unity, regardless of process conditions. Increasing voltage significantly chan… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
13
0

Year Published

2004
2004
2021
2021

Publication Types

Select...
8
1
1

Relationship

2
8

Authors

Journals

citations
Cited by 28 publications
(13 citation statements)
references
References 20 publications
0
13
0
Order By: Relevance
“…The importance of interfacial oxides between nc-Si dots for suppression of electron energy relaxation has also been supported by theoretical calculations of phonon modes and electron wave functions in the interconnected nc-Si chains. 15 Improvement of electron emission stability to a practical level would be attained by further suppression of interfacial defects.…”
Section: Resultsmentioning
confidence: 99%
“…The importance of interfacial oxides between nc-Si dots for suppression of electron energy relaxation has also been supported by theoretical calculations of phonon modes and electron wave functions in the interconnected nc-Si chains. 15 Improvement of electron emission stability to a practical level would be attained by further suppression of interfacial defects.…”
Section: Resultsmentioning
confidence: 99%
“…One of the reasons is that current injection into nc-Si causes a significant decrease in the internal quantum efficiency due to the interfacial oxide layer. To circumvent this problem, we propose a new high-energy electron emission approach which is unique to nc-Si dot array structures [17,23].…”
Section: Silicon Photonic Devicesmentioning
confidence: 99%
“…The emission mechanism is based on a specific field-induced electron transport in the nc-Si layer: quasiballistic electrons are generated via multiple tunneling through a chain of nc-Si dots interconnected with thin oxide films [2][3][4][5] and are subsequently ejected into vacuum via tunneling through the top contact. The mean energy of emitted electrons extends to several electron volts.…”
Section: Introductionmentioning
confidence: 99%