New developments at Physikalisch Technische Bundesanstalt in three-dimensional atomic force microscopy with tapping and torsion atomic force microscopy mode and vector approach probing strategy

Dai, Gaoliang; Häßler-Grohne, Wolfgang; Hüser, Dorothee; Wolff, Helmut; Fluegge, Jens; Bosse, Harald

doi:10.1117/1.jmm.11.1.011004

Cited by 31 publications

(39 citation statements)

References 11 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…However, the destructive nature of sample preparation in the TEM means that TEM must be used in conjunction with other microscopy techniques such as scanning electron, optical or atomic force. Both NIST and PTB have been extremely active in this area developing measurement techniques and samples so that the effects of the tip width on CD-AFM measurements could be calculated and taken into account in the final measurement uncertainty [102][103][104][105][106][107]. Samples were developed that comprised a series of linewidth structures that could be measured using CD-AFM.…”

Section: Secondary Methods Of Realizing the Metre For Dimensional Nanometrologymentioning

confidence: 99%

“…This allowed the true width of the structure to be determined and then the CD-AFM measurements of all the structures could be compensated based on the difference between the CD-AFM and TEM measurements of the same structure. Using this approach, the measurement uncertainty has been reduced to below 2 nm (k = 2) with the uncertainty associated with the TEM-CD-AFM experiment 0.6 nm a (k = 2) [102][103][104][105][106].…”

Section: Secondary Methods Of Realizing the Metre For Dimensional Nanometrologymentioning

confidence: 99%

See 1 more Smart Citation

The new mise en pratique for the metre—a review of approaches for the practical realization of traceable length metrology from 10⁻¹¹ m to 10¹³ m

2021

View full text Add to dashboard Cite

The revised International System of Units (SI) came into force on May 20, 2019. Simultaneously, updated versions of supporting documents for the practical realization of the SI base units (mises en pratique) were published. This review paper provides an overview of the updated mise en pratique for the SI base unit of length, the metre, that now gives practical guidance on realisation of traceable length metrology spanning 24 orders of magnitude. The review begins by showing how the metre may be primarily realized through time of flight and interferometric techniques using a variety of types of interferometer. Examples of techniques for measuring the interferometric phase and coping when the integer interference order is unknown are then described, together with examples of typical uncertainty contributions that may be encountered. The requirements for traceable nanoscale metrology and the need for an alternative secondary metre as identified by the Consultative Committee for Length’s Working Group on Nanometrology are outlined. These led to the inclusion in the mise en pratique of secondary realisations of the length unit at the nanometre and sub nanometre scale, based on the lattice spacing of silicon. Three measurement techniques using this secondary realisation are then described in detail. The paper concludes by emphasising that measurements made today over 24 order of magnitude are still compatible with measurements made using the metre as adopted over 200 years ago.

show abstract

Section: Secondary Methods Of Realizing the Metre For Dimensional Nanometrologymentioning

confidence: 99%

Section: Secondary Methods Of Realizing the Metre For Dimensional Nanometrologymentioning

confidence: 99%

The new mise en pratique for the metre—a review of approaches for the practical realization of traceable length metrology from 10⁻¹¹ m to 10¹³ m

2021

View full text Add to dashboard Cite

show abstract

“…A 3D AFM has been built up at PTB recently [25]. It is able to probe surfaces in arbitrary planes, e.g.…”

Section: Measurements Of Ler Using Afmmentioning

confidence: 99%

Modelling line edge roughness in periodic line-space structures by Fourier optics to improve scatterometry

Gross

Heidenreich

Henn

et al. 2014

JEOS:RP

View full text Add to dashboard Cite

In the present paper, we propose a 2D-Fourier transform method as a simple and efficient algorithm for stochastical and numerical studies to investigate the systematic impacts of line edge roughness on light diffraction pattern of periodic line-space structures. The key concept is the generation of ensembles of rough apertures composed of many slits, to calculate the irradiance of the illuminated rough apertures far away from the aperture plane, and a comparison of their light intensities to those of the undisturbed, 'non-rough' aperture. We apply the Fraunhofer approximation and interpret the rough apertures as binary 2D-gratings to compute their diffraction patterns very efficiently as the 2D-Fourier transform of the light distribution of the source plane. The rough edges of the aperture slits are generated by means of power spectrum density (PSD) functions, which are often used in metrology of rough geometries. The mean efficiencies of the rough apertures reveal a systematic exponential decrease for higher diffraction orders if compared to the diffraction pattern of the unperturbed aperture. This confirms former results, obtained by rigorous calculations with computational expensive finite element methods (FEM) for a simplified roughness model. The implicated model extension for scatterometry by an exponential damping factor for the calculated efficiencies allows to determine the standard deviation σ r of line edge roughness along with the critical dimensions (CDs), i.e., line widths, heights and other profile properties in the sub-micrometer range. First comparisons with the corresponding roughness value determined by 3D atomic force microscopy (3D AFM) reveal encouraging results.

show abstract

“…8,9 An alternative implementation of CD-AFM based on the vector approach probing method has also been developed to enhance measuring flexibility as well as to reduce tip wear. 10 Finally, the past decade has also witnessed the dramatic rise of interest in critical dimension small angle x-ray scattering (CDSAXS) as a potential reference metrology. 11,12 …”

Section: Introductionmentioning

confidence: 99%

Evaluation of carbon nanotube probes in critical dimension atomic force microscopes

Choi

Park

Ahn

et al. 2016

J. Micro/Nanolith. MEMS MOEMS

View full text Add to dashboard Cite

The decreasing size of semiconductor features and the increasing structural complexity of advanced devices have placed continuously greater demands on manufacturing metrology, arising both from the measurement challenges of smaller feature sizes and the growing requirement to characterize structures in more than just a single critical dimension. For scanning electron microscopy, this has resulted in increasing sophistication of imaging models. For critical dimension atomic force microscopes (CD-AFMs), this has resulted in the need for smaller and more complex tips. Carbon nanotube (CNT) tips have thus been the focus of much interest and effort by a number of researchers. However, there have been significant issues surrounding both the manufacture and use of CNT tips. Specifically, the growth or attachment of CNTs to AFM cantilevers has been a challenge to the fabrication of CNT tips, and the flexibility and resultant bending artifacts have presented challenges to using CNT tips. The Korea Research Institute for Standards and Science (KRISS) has invested considerable effort in the controlled fabrication of CNT tips and is collaborating with the National Institute of Standards and Technology on the application of CNT tips for CD-AFM. Progress by KRISS on the precise control of CNT orientation, length, and end modification, using manipulation and focused ion beam processes, has allowed us to implement ball-capped CNT tips and bent CNT tips for CD-AFM. Using two different generations of CD-AFM instruments, we have evaluated these tip types by imaging a line/space grating and a programmed line edge roughness specimen. We concluded that these CNTs are capable of scanning the profiles of these structures, including re-entrant sidewalls, but there remain important challenges to address. These challenges include tighter control of tip geometry and careful optimization of scan parameters and algorithms for using CNT tips.

show abstract

New developments at Physikalisch Technische Bundesanstalt in three-dimensional atomic force microscopy with tapping and torsion atomic force microscopy mode and vector approach probing strategy

Cited by 31 publications

References 11 publications

The new mise en pratique for the metre—a review of approaches for the practical realization of traceable length metrology from 10⁻¹¹ m to 10¹³ m

The new mise en pratique for the metre—a review of approaches for the practical realization of traceable length metrology from 10⁻¹¹ m to 10¹³ m

Modelling line edge roughness in periodic line-space structures by Fourier optics to improve scatterometry

Evaluation of carbon nanotube probes in critical dimension atomic force microscopes

Contact Info

Product

Resources

About

New developments at Physikalisch Technische Bundesanstalt in three-dimensional atomic force microscopy with tapping and torsion atomic force microscopy mode and vector approach probing strategy

Cited by 31 publications

References 11 publications

The new mise en pratique for the metre—a review of approaches for the practical realization of traceable length metrology from 10−11 m to 1013 m

The new mise en pratique for the metre—a review of approaches for the practical realization of traceable length metrology from 10−11 m to 1013 m

Modelling line edge roughness in periodic line-space structures by Fourier optics to improve scatterometry

Evaluation of carbon nanotube probes in critical dimension atomic force microscopes

Contact Info

Product

Resources

About

The new mise en pratique for the metre—a review of approaches for the practical realization of traceable length metrology from 10⁻¹¹ m to 10¹³ m

The new mise en pratique for the metre—a review of approaches for the practical realization of traceable length metrology from 10⁻¹¹ m to 10¹³ m