2007
DOI: 10.1016/j.surfcoat.2006.09.017
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New approach to plasma diagnostic

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Cited by 5 publications
(6 citation statements)
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“…The ratio of ion beam and plasma ion saturation current at the target can be varied over a wide range with changing the dc vacuum arc current, accelerating voltage amplitude and pulse repetition rate, and source-target distance. 6 As a result of ion implantation and recoil atoms introduction into the target surface layer, the dose of introduced dopants can exceed the irradiation dose, and the near-surface concentration can reach 100 at. %.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The ratio of ion beam and plasma ion saturation current at the target can be varied over a wide range with changing the dc vacuum arc current, accelerating voltage amplitude and pulse repetition rate, and source-target distance. 6 As a result of ion implantation and recoil atoms introduction into the target surface layer, the dose of introduced dopants can exceed the irradiation dose, and the near-surface concentration can reach 100 at. %.…”
Section: Resultsmentioning
confidence: 99%
“…[1][2][3][4] Fundamentally new possibilities for the development of this scientific direction appeared after the creation of the high-current plasma and ion-beam source "Raduga-5." 5,6 The main advantages of this source are stability of parameters, long operation lifetime, the possibility of realization of highconcentration and high-intensity ion implantation modes, and high throughput of ion-beam and plasma material treatments.…”
Section: Introductionmentioning
confidence: 99%
“…The previous experiments of earlier [26,[34][35][36][37][38][39][40][44][45][46] are showed that in the event of atmospheric contamination with a radioactive impurity in it due to ionization of the air, ionization formations appear -plasmoids. The transverse dimensions of these formations depend on the area of contamination (general case).…”
Section: Methodsmentioning
confidence: 99%
“…[26][27][28][29][30][31][32][33]. The radar method surpasses these methods in detection range, sensitivity, data processing time and spatial resolution [24][25][26][27][28][29][30][31][32][33][34][35][36][37][38][39][40][41][42][43].…”
Section: Introductionmentioning
confidence: 99%
“…The traditional advantages of plasma-immersion approach to ion flow formation are connected with the absence of ion-optical systems, opportunity of large surface areas treatment and parts of complex shape [13]. Transition to high-frequency short-pulsed plasma-immersion ion implantation and (or) deposition (HFSP 2 I 3 D) regime enables to reduce the probability of arcing to increase the bias potential on the substrate, to realize the coating deposition using dense and very dense plasma on metal and dielectric target [14,15].…”
Section: Equipmentmentioning
confidence: 99%