High-current vacuum-arc ion and plasma source “Raduga-5” application to intermetallic phase formation

Abstract

Phase composition, structural state, and mechanical properties of the ion-doped surface layers of Ni, Ti, and Fe targets with Al and Ti ions implanted into using the metal ion beam and plasma source Raduga 5 have been investigated. The high-intensity mode of implantation allowed us to obtain the ion-doped layers with the thickness exceeding the ion projected range by several orders of magnitude. By the transmission electron microscopy, it has been found that the fine-dispersed equilibrium intermetallic phases ͑Me 3 Al, MeAl͒ and the solid solution of aluminum were formed in the doped Ni, Ti, and Fe surface layers at the depth of up to 2600 nm. The maximum dopant concentration reached 75%. It has been shown that the average size of the formed phases was of 70 nm. The microhardness of the different target surface layers increased by 1.5-3 times. The wear resistance of the samples did not change within the temperature range of 300-700 K.

Physical Base of the Metallic Gradient Surface Layers of Titanium Alloys Formed under Ion Implantation

“…The effect of the ion implantation conditions on the element-phase composition, the localization of phases on the doped layer depth, and the structural features of modified materials were investigated. The apparatus equipped with an accelerated ion source «Raduga-5» [5] based on the continuous vacuum arc discharge for the irradiation doses of 2.2•10 17 -1.0•10 19 ion/cm 2 .…”

“…The formation of intermetallic structures in surface layers of metals can be successfully realized by irradiation of the surface with high intensity beams [4]. This mode of implantation makes it possible to achieve high ion doses and irradiated target temperatures under conditions of high ionbeam density, which can lead to significant increase of the ion-alloyed surface layer thickness with a nonuniform gradient structure [4,5]. The models developed at present and surface modifications upon ion implantation have been experimentally substantiated for coarsegrained materials.…”

Equipment and methods for hybrid technologies of ion beam and plasma surface materials modification

“…Radiation-stimulation diffusion processes, contributed to the doped layer formation at a depth N2 µm. The average size of the formed phases constituted 24-65 nm [4]. Under conditions of Al introduction in the form of ions and recoil atoms, the retained dopant dose reached 3.6 • 10 18 ion cm − 2 , which is 1.6 times more than the irradiation dose.…”

“…After deposition of 6 µm coating to VT-6 target, the formation of an amorphous layer was observed in the surface layer at depths up to (1)(2)(3)(4) for j i = 10 mA/cm 2 and ratio of accelerating ion current density ( j i ) to plasma ion current density ( j p ) (5,6) of the duty factor (Q). HFSPPI 3 D:…”

“…Such systems can be created under the regime of high concentration ion implantation (HCII) [3,4] and deposition of multilayer functionally-gradient coatings, containing up to several thousands of separate layers with thickness from several units to several tens or even hundreds of nanometers [5,6].…”