2009
DOI: 10.1016/j.surfcoat.2009.02.126
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Equipment and methods for hybrid technologies of ion beam and plasma surface materials modification

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Cited by 11 publications
(5 citation statements)
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“…Intermediate titanium coating was formed by vacuum-arc method on the Complex Plant (CP) in TPU [3]. During the formation of the primer valve group metal on the surface of stainless steel the CP was equipped with four vacuum arc plasma generators with titanium cathodes, the gas plasma generator and short-pulse high-frequency bias voltage generator.…”
Section: Methodsmentioning
confidence: 99%
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“…Intermediate titanium coating was formed by vacuum-arc method on the Complex Plant (CP) in TPU [3]. During the formation of the primer valve group metal on the surface of stainless steel the CP was equipped with four vacuum arc plasma generators with titanium cathodes, the gas plasma generator and short-pulse high-frequency bias voltage generator.…”
Section: Methodsmentioning
confidence: 99%
“…To form the Ti layer on the substrate was used the Complex Plant for the implementation of hybrid technologies of ion-beam and ion-plasma modification of materials [3], which provided the obtaining of the sufficient thickness of Ti layer for the MAO process, good adhesion and technologically justified rate of its deposition.…”
Section: Introductionmentioning
confidence: 99%
“…Intermediate titanium coating from plasma of continuous vacuum-arc discharge in terms of short-pulse, highfrequency plasma-immersion ion assisting was formed on the Complex Plant (CP) in TPU [14].…”
Section: Methodsmentioning
confidence: 99%
“…To form the Ti layer on the substrate the Complex Plant for the implementation of hybrid technologies of ion-beam and ion-plasma modification of materials was used [14], which provided the obtaining of the sufficient thickness of Ti layer for the MAO process, good adhesion and technologically justified rate of its deposition.…”
Section: Introductionmentioning
confidence: 99%
“…The Ti underlayer and TiN coatings were deposited in a hybrid «Arc spectrum» technique which was developed in Tomsk Polytechnic University. Vacuum arc evaporator with coaxial plasma filter (designed by authors [9,10]) was used for AIP method. Firstly, the chamber was evacuated to a base pressure of lower, than 2.5×10 -3 Pa. Before deposition, samples were subjected to ion bombardment in an argon glow discharge at 1500 V for 5 min.…”
Section: Introductionmentioning
confidence: 99%