1988
DOI: 10.1557/proc-116-91
|View full text |Cite
|
Sign up to set email alerts
|

New Approach to Growth of High-Quality GaAs Layers on Si Substrates

Abstract: GaAs layers were grown on Si (001) substrates by molecular beam epitaxy (MBE) and migration enhanced epitaxy (MEE). They were examined by transmission electron microscopy, doublecrystal X-ray diffraction and Rutherford backscattering/channeling technique. Initial layer growth in both MEE and MBE was governed by three-dimensional nucleation but a stronger tendency for GaAs islands to align along the surface steps of Si was observed in the case of MEE. There was no measurable tilt between the (001) planes of GaA… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
3
0

Year Published

1990
1990
1999
1999

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 8 publications
(3 citation statements)
references
References 11 publications
0
3
0
Order By: Relevance
“…The rotation of the (001) plane of the layer is found to be in the opposite direction to that given by the simple tilt model or the Poisson effect (e.g. Schowalter 1988, Varrio 1988, Stolz 1988). If there is no relief of the tensile strain developed in the film, there should be a rotation of -15" for an offcut of 4%.…”
mentioning
confidence: 59%
See 1 more Smart Citation
“…The rotation of the (001) plane of the layer is found to be in the opposite direction to that given by the simple tilt model or the Poisson effect (e.g. Schowalter 1988, Varrio 1988, Stolz 1988). If there is no relief of the tensile strain developed in the film, there should be a rotation of -15" for an offcut of 4%.…”
mentioning
confidence: 59%
“…This rotation must therefore arise from the action of 60* dislocations. An interesting point was raised by Varrio et al (1988), who noted that different growth methods could lead to vastly different rotations. It was found that the rotation was much less when a pulsed beam was used in MBE rather than the usual continuous beam.…”
mentioning
confidence: 99%
“…The question of the origin of the misorientation in epitaxially grown heterostructures is presently a matter of controversy. For instance, for a Si substrate, Varrio et al [20] noted that different GaAs growth methods can lead to vastly different rigid-body misorientations. The preparation of the substrate surface is consequently an important parameter (miscut angle, ªepireadyº or previously chemically treated surface), as well as the deposition parameters (temperature, species fluxesF F F).…”
Section: Introductionmentioning
confidence: 99%