2014
DOI: 10.1145/2637364.2591994
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Neighbor-cell assisted error correction for MLC NAND flash memories

Abstract: Continued scaling of NAND flash memory to smaller process technology nodes decreases its reliability, necessitating more sophisticated mechanisms to correctly read stored data values. To distinguish between different potential stored values, conventional techniques to read data from flash memory employ a single set of reference voltage values, which are determined based on the overall threshold voltage distribution of flash cells. Unfortunately, the phenomenon of program interference, in which a cell's thresho… Show more

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Cited by 46 publications
(99 citation statements)
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“…There have been recent large-scale field studies a well as small-scale controlled studies of real memory errors on real devices and systems, showing that both DRAM and NAND flash memory technologies are becoming less reliable [82, 78, 98-100, 77, 93, 28, 27, 74, 73, 17, 25, 79, 84, 80]. As detailed experimental analyses of real DRAM and NAND flash chips show, both technologies are becoming much more vulnerable to cell-to-cell interference effects [82,55,26,22,20,17,21,81,72,23,28,27,79,80], data retention is becoming significantly more difficult in both technologies [69,47,70,49,89,31,46,75,25,18,71,17,21,19,81,48,28,27,74,73,82,79], and error variation within and across chips is increasingly prominent [70,63,30,29,17,21,64,[51]…”
Section: Other Potential Vulnerabilitiesmentioning
confidence: 99%
“…There have been recent large-scale field studies a well as small-scale controlled studies of real memory errors on real devices and systems, showing that both DRAM and NAND flash memory technologies are becoming less reliable [82, 78, 98-100, 77, 93, 28, 27, 74, 73, 17, 25, 79, 84, 80]. As detailed experimental analyses of real DRAM and NAND flash chips show, both technologies are becoming much more vulnerable to cell-to-cell interference effects [82,55,26,22,20,17,21,81,72,23,28,27,79,80], data retention is becoming significantly more difficult in both technologies [69,47,70,49,89,31,46,75,25,18,71,17,21,19,81,48,28,27,74,73,82,79], and error variation within and across chips is increasingly prominent [70,63,30,29,17,21,64,[51]…”
Section: Other Potential Vulnerabilitiesmentioning
confidence: 99%
“…Wearout increases the inaccuracy during program and erase operations, thereby increasing the number of P/E cycling errors. Cell-to-cell program interference errors [15,16] are another type of write-induced error that increases the threshold voltage of a cell and thereby increases the RBER, when an adjacent cell in another wordline is being programmed. Since parasitic capacitance coupling exists between cells within close proximity of each other, when a high programming voltage is applied on one cell, the capacitance coupling adds charge to the transistors of the adjacent cells, increasing the program interference errors.…”
Section: Errors In Nand Flash Memorymentioning
confidence: 99%
“…First, we perform a detailed characterization and analysis of three error characteristics that are drastically different in 3D NAND flash memory than in planar NAND flash memory: layer-to-layer process variation (Section 4.2), early retention loss (Section 4.3), and retention interference (Section 4.4). In addition to identifying new error sources in 3D NAND flash memory, we use our methodology to corroborate and quantify 3D NAND error characteristics that are a result of error sources that were previously identified in planar NAND flash memory, including retention loss [6-9, 11, 23, 80], P/E cycling [9,11,14,64,80,81], program interference [4,9,11,15,16,80], read disturb [5,9,11,81], and process variation [13,84]. We summarize our findings for these error types in Section 4.5, and provide detailed results on our characterization of these previously-identified error sources in Appendix A.…”
Section: Characterization Of 3d Nand Flash Memory Errorsmentioning
confidence: 99%
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