2018
DOI: 10.1103/physrevmaterials.2.025601
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Near-thermal limit gating in heavily doped III-V semiconductor nanowires using polymer electrolytes

Abstract: Doping is a common route to reducing nanowire transistor on-resistance but has limits. High doping level gives significant loss in gate performance and ultimately complete gate failure. We show that electrolyte gating remains effective even when the Be doping in our GaAs nanowires is so high that traditional metal-oxide gates fail. In this regime we obtain a combination of subthreshold swing and contact resistance that surpasses the best existing p-type nanowire MOSFETs. Our sub-threshold swing of 75 mV/dec is… Show more

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Cited by 7 publications
(5 citation statements)
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“…The disadvantage is the difficulty involved in achieving low-resistance ohmic contacts to p-GaAs nanowires. Low-resistance contacts (∼30 kΩ) can be achieved using GaAs nanowires with a heavily Be-doped shell; however, such heavy doping means conventional metal–oxide gating fails . Here we demonstrate that this problem can be overcome by carefully etching the nanowire to reduce the local Be-doping density at the locations where gates are patterned prior to depositing gate metal directly on the nanowire surface.…”
mentioning
confidence: 91%
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“…The disadvantage is the difficulty involved in achieving low-resistance ohmic contacts to p-GaAs nanowires. Low-resistance contacts (∼30 kΩ) can be achieved using GaAs nanowires with a heavily Be-doped shell; however, such heavy doping means conventional metal–oxide gating fails . Here we demonstrate that this problem can be overcome by carefully etching the nanowire to reduce the local Be-doping density at the locations where gates are patterned prior to depositing gate metal directly on the nanowire surface.…”
mentioning
confidence: 91%
“…Low resistance contacts (∼ 30 kΩ) can be achieved using GaAs nanowires with a heavily Be-doped shell, 28 however, such heavy doping means conventional metal-oxide gating fails. 29 Here we demonstrate that this problem can be overcome by carefully etching the nanowire to reduce the local Be-doping density at the locations where gates are patterned prior to depositing gate metal directly on the nanowire surface. Our approach provides both strong, low-leakage gating and low contact resistance simultaneously.…”
mentioning
confidence: 97%
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“…Semiconducting nanowires were demonstrated to be highly appropriate to this aim. [23][24][25][26] Conversely, their reduced lateral dimension may allow them to probe the local ionic density with high spatial resolution thus yielding access to microscopic parameters of interest for the design of novel thermoelectric polyelectrolytes and for material characterization.…”
Section: Introductionmentioning
confidence: 99%
“…The effective miniaturization of electronic devices and the consequent reach of the nanoscale [12] combined with the introduction of novel and better-performing gating techniques [13][14][15][16] reintroduce the possibility to exploit electrostatic doping for the electronic nanodevices. Indeed, the electric field acting near the surface of the semiconductor and inducing space charge densities near the boundaries of the material does not represent an issue for nano-sized objects.…”
Section: Introductionmentioning
confidence: 99%