2018
DOI: 10.1016/j.microrel.2018.07.138
|View full text |Cite
|
Sign up to set email alerts
|

NBTI and irradiation related degradation mechanisms in power VDMOS transistors

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
1
1

Year Published

2019
2019
2022
2022

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 12 publications
(2 citation statements)
references
References 38 publications
0
1
1
Order By: Relevance
“…It is illustrated that the interface trap density N it raises obviously along with radiation dose at an approximate rate of 6.58 × 10 9 cm −2 per 100 krad(Si). The value of interface trap density in our study is slightly smaller than that of Bonaldo's work [27], and higher than the value of N. Stojadinović's research [34]. This may be caused by the different tested method and manufacturing process.…”
Section: Resultscontrasting
confidence: 81%
“…It is illustrated that the interface trap density N it raises obviously along with radiation dose at an approximate rate of 6.58 × 10 9 cm −2 per 100 krad(Si). The value of interface trap density in our study is slightly smaller than that of Bonaldo's work [27], and higher than the value of N. Stojadinović's research [34]. This may be caused by the different tested method and manufacturing process.…”
Section: Resultscontrasting
confidence: 81%
“…Among the others, in Refs. [17][18][19], the effects induced by previous irradiation and the total dose received strongly affect the subsequent stresses. Specifically, in the case of low-dose irradiation, following stress caused by working in specific applications, this appears to result in device degradation in the future.…”
Section: Introductionmentioning
confidence: 99%