Nanoporous gyroid metal oxides with controlled thickness and composition by atomic layer deposition from block copolymer templates

Abstract

Nanoporous gyroid metal oxides were fabricated with controlled tube thickness and composition by templated atomic layer deposition giving high porosity and large specific surface area as well as superior mechanical properties.

Long‐Range Ordered Double Gyroid Structures via Solution Casting from Poly(2,2,2‐trifluoroethyl methacrylate)‐block‐poly(2‐vinyl pyridine)

“…[ 16,21 ] For the PTFEMA 46 ‐ b ‐P2VP 83 films, the appearance of an additional (110) reflection at a relative q value of √2 was observed, which may be attributed to network shifting during solvent evaporation, caused symmetry breaking to the gyroid networks, resulting in new scattering spots. [ 15 ] The 2D profile and SAXS image were analyzed to obtain more detailed attributions (Figure 1B). In the 2D profile, gyroid‐derived spots were also observed, although almost no rings were observed.…”

“…[ 14 ] described the formation mechanism of the DG structure of polystyrene‐ b ‐poly( l ‐lactide) with numerous block copolymers, and the development of applications related to this structure has also been reported. [ 15 ] In addition, Loos et al. [ 16 ] reported a composite of polystyrene‐ b ‐poly(4‐vinylpyridine) and pentadecylphenol cast from a chloroform solution (<2 wt%) to give a supramolecular complex film with a typical Ia3d gyroid pattern.…”

Poly(cyclohexylethylene)-block-Poly(lactide) Oligomers for Ultrasmall Nanopatterning Using Atomic Layer Deposition

“…As an aside, a separate low molar mass sample PCHE–PLA (3.2, 0.44) adopted the gyroid morphology in bulk by SAXS (√3q, √4q, √7q, √8q, √10q, √11q, √12q, √13q) upon annealing at 130 °C for 24 h (Figure S11a). Block polymers that adopt a gyroid morphology are of great interest as templates for the fabrication of nanohybrids and nanoporous materials for applications such as solar cells, photonics and catalysis. − A thin film of this polymer annealed at 130 °C for 12 h produced an oriented gyroid morphology by GISAXS (Figure S11b) with similar principal domain spacing of 16.3 nm. , The PLA was removed from this sample by basic hydrolysis to achieve a nanoporous PCHE film (Figure S11c) with a similar scattering pattern and pore diameter of 4.5 nm, indicating minute film shrinkage during the hydrolysis step. , …”

Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks

“…In recent years, the potential of ALD based on these benefits has expanded to nanotechnology [7]. As a representative example, ALD has been combined with three-dimensional (3D) polymer nanostructuring methods such as electrospinning, block-copolymer (BCP) lithography [8][9][10][11][12], direct laser writing (DLW) [13][14][15][16][17], multibeam interference lithography (MBIL) [18][19][20], and phase-mask interference lithography (PMIL) [21][22][23][24][25][26][27][28][29][30]. These unconventional nanofabrication techniques specialize in the production of 3D polymer nanonetworks that can serve as templates for subsequent material conversion processes [31].…”

“…Various inorganic thin films conformally deposited on 3D nanonetwork polymer templates through thermal ALD: (a) SEM image of a ZnO thin film deposited on a polymer template formed by electrospinning; (b) TEM image of (a) (reprinted with permission from[71]. Copyright 2012 American Chemical Society); (c) TEM image of Al 2 O 3 and ZnO thin films deposited on a polymer template formed by BCP lithography (reprinted with permission from[9]. Copyright 2015 The Royal Society of Chemistry); (d) cross-sectional SEM image of an Al-doped ZnO thin film on a polymer template formed by DLW (reprinted with permission from[14].…”