Nanoimprint using three-dimensional microlens mold made by focused-ion-beam chemical vapor deposition

Watanabe, Keiichiro; Morita, T.; Kometani, Reo; Hoshino, Takayuki; Kondo, Kazushige; Kanda, Kazuhiro; Haruyama, Yuichi; Kaito, Takashi; Fujita, Jun–ichi; Ishida, Masahiko; Ochiai, Yukinori; Tajima, Tsuyoshi; Matsui, Shinji

doi:10.1116/1.1633281

Cited by 37 publications

(26 citation statements)

References 12 publications

(11 reference statements)

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“…Intervals of the squares and circles were 450 nm, 950 nm and 1000 nm, respectively. The selected beam current was 9 pA (beam size: 13 nm, FWHM), and the irradiated fluence was 5 E+15 ions/cm 2 . It has been reported that the etching rate of RX-PTFE by FIB direct etching was about 5.9 E-16 µm/ (ions cm 2 ) (Fukutake et al, 2010).…”

Section: Fib Fabrication Processmentioning

confidence: 99%

See 1 more Smart Citation

Improvement of the Durability of Crosslinked PTFE Molds for UV- /EB-Nanoimprint Lithography

Takahashi

Kobayashi

Okubo

et al. 2012

J. Photopol. Sci. Technol.

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It has been reported that the nano-/micro-fabricated crosslinked polytetrafluoroethylene (RX-PTFE) by focused ion beam (FIB) direct etching technique could be used as the polymeric molds for the ultraviolet nanoimprint lithography (UV-NIL) and electron beam NIL (EB-NIL). In this study, to evaluate the durability of RX-PTFE molds for repeating printing cycles, the RX-PTFE was spin-coated on two kinds of substrates; none-metal treated silicon wafer and 50 nm thick Al-layer deposited one. Then, RX-PTFE molds were obtained by FIB irradiation. 450 × 450 nm and 950 × 950 nm squares and 1000 nm circle were fabricated in 40 × 40 µm areas. Intervals of the squares and circle were 450 nm, 950 nm and 1000 nm, respectively. In the case of none-treated substrate, the 3 rd imprinted pattern was distorted. On the other hand, the 10 th imprinted patterns with UV-NIL were successfully obtained with the Al-layer deposited substrate. Though it is concerned about the mechanical strength of RX-PTFE degrading due to EB irradiation, EB-NIL was similarly succeeded with Al-layer deposited substrate. It is considered that the mold durability for printing would be improved due to high adhesion between Al-layer and RX-PTFE, because the fluorination of Al was caused by crosslinking treatment at high temperatures. Thus, it is suggested that the durability of RX-PTFE mold with Al-layer deposited substrate would be retained after 10 times UV-/EB-NIL processes.

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Section: Fib Fabrication Processmentioning

confidence: 99%

“…Generally, there are two types of methods for the NIL: the thermal and UV light curing. To fabricate a lot of nano-/micro-scale patterns with NIL, the durability of the molds for repeating printing times is one of the most important factors for industrial applications [2][3][4].…”

Section: Introductionmentioning

confidence: 99%

Improvement of the Durability of Crosslinked PTFE Molds for UV- /EB-Nanoimprint Lithography

Takahashi

Kobayashi

Okubo

et al. 2012

J. Photopol. Sci. Technol.

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“…The molds for thermal-NIL are mainly made of metals or ceramics, such as Ni, Si, SiO 2 and Al 2 O 3 , and the thermoplastic polymer or thermo curable monomers are used. It has a wide choice of the imprinted matrix.…”

Section: Introductionmentioning

confidence: 99%

“…It has a wide choice of the imprinted matrix. However, it takes a long time for heating and cooling treatment of them, because it is often carried out at high pressure and high temperature which would be over the glass transition temperature or melting temperature of them [2][3][4].…”

Section: Introductionmentioning

confidence: 99%

Transparent Crosslinked PTFE Mold Fabrication and Nano- /Micro-Pattern Transfer to Photo-Curable Resin

Kobayashi

Oyama

Oshima

et al. 2012

J. Photopol. Sci. Technol.

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Nano-/micro-scale structures of transparent crosslinked polytetrafluoroethylene (RX-PTFE) mold have been fabricated by combined process which is thermal and radiation process for fabrication of RX-PTFE (TRaf process). The nano-/micro-fabricated RX-PTFE were attempted to be applied for the transparent polymer molds of UV nanoimprint lithography (NIL). The ability of the RX-PTFE mold for UV-NIL was evaluated by the imprinted patterns. The RX-PTFE molds and the imprinted structures obtained by UV-NIL were observed by a field emission scanning electron microscope (FE-SEM). As a result, imprinted structures of photo-curable resin (Trimethylolpropane-triacrylate: TMPTA) by UV-NIL using RX-PTFE mold were successfully obtained. The nano-scale L&S patterns, square (410 nm × 410 nm) and hole ( 170 nm) array patterns were clearly obtained.

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“…K. Watanabe et al developed a three-dimensional microlens mold made by focused-ion-beam chemical vapor deposition [12]. The microlens mold was used to fabricate PDMS microlens array.…”

Section: Introductionmentioning

confidence: 99%

Concave microlens array mold fabrication in photoresist using UV proximity printing

2006

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This paper presents a simple and effective method to fabricate a polydimethyl-siloxane (PDMS) microlens array with a high fill factor, which utilizes the UV proximity printing and photoresist replication methods. The concave microlens array mold was made using a printing gap in lithography process, which utilizes optical diffraction of UV light to deflect away from the aperture edges and produces a certain exposure in the photoresist material outside the aperture edges. This method can precisely control the geometric profile of concave microlens array. The experimental results showed that the concave micro-lens array in photoresist could be formed automatically when the printing gap ranged from 240 μm to 720 μm. High fill factor microlens array can be produced, when the control pitch distance between the adjacent apertures of the concave microlens array was decreased to the aperture size.

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Nanoimprint using three-dimensional microlens mold made by focused-ion-beam chemical vapor deposition

Abstract: Development of a laser-focused ion beam combination machinea) Rev. Sci. Instrum. 81, 02B702 (2010); 10.1063/1.3258427Three-dimensional and multimaterial microfabrication using focused-ion-beam chemical-vapor deposition and its application to processing nerve electrodes

Cited by 37 publications

References 12 publications

Improvement of the Durability of Crosslinked PTFE Molds for UV- /EB-Nanoimprint Lithography

Improvement of the Durability of Crosslinked PTFE Molds for UV- /EB-Nanoimprint Lithography

Transparent Crosslinked PTFE Mold Fabrication and Nano- /Micro-Pattern Transfer to Photo-Curable Resin

Concave microlens array mold fabrication in photoresist using UV proximity printing

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