2010
DOI: 10.1016/j.mee.2009.11.003
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Nanoimprint lithography fabrication of waveguide-integrated optical gratings with inexpensive stamps

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Cited by 17 publications
(10 citation statements)
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“…The new configuration is more efficient and compatible with evanescent wave sensing devices. [6][7][8]12,28 We report the characterization of this particle/cell collection device with regard to chamber height, applied potentials, frequency, electrode geometry, electrode and gap width, repetition of asymmetric electrode patterns, and electrolyte concentration. We also introduce techniques combining ACEO with DEP to improve the performance of the device for collecting particles and cells from suspension.…”
Section: Introductionmentioning
confidence: 99%
“…The new configuration is more efficient and compatible with evanescent wave sensing devices. [6][7][8]12,28 We report the characterization of this particle/cell collection device with regard to chamber height, applied potentials, frequency, electrode geometry, electrode and gap width, repetition of asymmetric electrode patterns, and electrolyte concentration. We also introduce techniques combining ACEO with DEP to improve the performance of the device for collecting particles and cells from suspension.…”
Section: Introductionmentioning
confidence: 99%
“…Grating-integrated optical waveguide devices were fabricated as described previously [3,5]. Briefly, the silicon oxynitride films were deposited in a capacitively coupled PECVD system (Oxford Plasmalab80 ® Plus) at rf frequencies of 100 kHz.…”
Section: Grating-integrated Waveguide Fabricationmentioning
confidence: 99%
“…A grating pattern was integrated with the slab waveguide using thermal nanoimprint lithography with a commercial replica grating as a template followed by dry etching. Details of the processing steps are reported in [5]. Holographic grating masters (3-4067, Optometrics) with grooves on a Λ=1μm pitch were used as masters.…”
Section: Grating-integrated Waveguide Fabricationmentioning
confidence: 99%
“…1,2 Compared with the conventional photolithography and other NGL techniques, such as the extreme ultraviolet, electron-beam, ion-beam, and X-ray lithography, NIL has a unique competitive advantage and extensive application prospects in the fabrication of micro/nano structures. [3][4][5][6][7] The key difference between them is that NIL is a contact patterning process based on the deformation of polymer materials and can reach a very high resolution that is not limited by the light diffraction or scattering. 8 Parallel surface contact between the template with predefined micro/nano patterns and the substrate that accepts the patterns is very critical for pattern fidelity in NIL, whereas the nonparallel surface contact will lead to the uneven patterns on the substrate.…”
Section: Introductionmentioning
confidence: 99%