2015
DOI: 10.1007/s00339-015-9038-y
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Nanoimprint lithography enables memristor crossbars and hybrid circuits

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Cited by 9 publications
(5 citation statements)
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“…[3][4][5][6][7] This allows integration of memristors into micro-and nanoelectronic devices using traditional nanofabrication techniques. [8][9][10] Nowadays, memristors are considered to be one of the key elements of newly developing neuromorphic electronics, 11,12 since it functionally mimics the synaptic plasticity of biological neurons [13][14][15] and thus is suitable for bioinspired technologies. 14,16,17 Neuromorphic electronics was triggered by the discovery of principal electric phenomena in a neuron cell membrane in the early 1950's.…”
Section: Introductionmentioning
confidence: 99%
“…[3][4][5][6][7] This allows integration of memristors into micro-and nanoelectronic devices using traditional nanofabrication techniques. [8][9][10] Nowadays, memristors are considered to be one of the key elements of newly developing neuromorphic electronics, 11,12 since it functionally mimics the synaptic plasticity of biological neurons [13][14][15] and thus is suitable for bioinspired technologies. 14,16,17 Neuromorphic electronics was triggered by the discovery of principal electric phenomena in a neuron cell membrane in the early 1950's.…”
Section: Introductionmentioning
confidence: 99%
“…Both methods require expensive equipment and multiple fabrication steps including a high temperature annealing step and a "forming" step. Other several methods of fabrications have been proposed such as electrohydrodynamic inkjet printing technology [22] or the conventional photolithography technology [23,24]. A nonvolatile nanoscale TiO2 device with synaptic properties was recently created by the Stanley Williams group at HP [25].…”
Section: Memristormentioning
confidence: 99%
“…In addition, systemlevel integration requires reliable 3D integration of crossbar arrays with underlying CMOS circuits. Direct fabrication of crossbar arrays on a foundry-developed CMOS chip should guarantee precise alignment and a low thermal budget [50].…”
Section: Current and Future Challengesmentioning
confidence: 99%
“…The NIL molds can be used repeatedly, allowing mass production of a crossbar structure in a highly costeffective way. To date, NIL has been successfully applied in the direct fabrication of memristor crossbar arrays on top of a foundry-made CMOS chip with optimized planarization techniques [50].…”
Section: Advances In Science and Technology To Meet Challengesmentioning
confidence: 99%