2006
DOI: 10.1109/tnb.2005.864013
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Nanofabrication of Polymer Surfaces Utilizing Colloidal Lithography and Ion Etching

Abstract: In this paper, we utilize colloidal lithography based on electrostatic self-assembly of polystyrene colloidal particles onto a polymer surface as a nanoscale mask. The pattern is then transferred to the surface by ion beam etching. Each particle acts as an individual mask, resulting in an array of identical structure. Ion beam exposure etches away the unmasked surface between the particles, so the particle mask pattern can be transferred into the polymer surface. This method allows to nanofabricate bulk polyme… Show more

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Cited by 17 publications
(11 citation statements)
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“…The pattern of the colloidal mask was transferred into the substrates by collimated Ar ion bombardment (CAIBE Ion Beam SystemOxford Ionfab-500 eV 0.2 mA/cm 2 , 151 off of normal incident angle for 10 min) resulting polymeric hemispherical structures standing on silicon surface (referred to as Hemi) [30]. The samples were checked using AFM.…”
Section: Methodsmentioning
confidence: 99%
“…The pattern of the colloidal mask was transferred into the substrates by collimated Ar ion bombardment (CAIBE Ion Beam SystemOxford Ionfab-500 eV 0.2 mA/cm 2 , 151 off of normal incident angle for 10 min) resulting polymeric hemispherical structures standing on silicon surface (referred to as Hemi) [30]. The samples were checked using AFM.…”
Section: Methodsmentioning
confidence: 99%
“…This approach is described in detail elsewhere [20,25,26], but in brief utilises electrostatically assembled dispersed monolayers of colloidal particles as masks for pattern transfer into substrate materials. In this work the substrate materials were pretreated with a light oxygen plasma (0.25 Torr, 50 W RF, 5 s-Batchtop) followed by electrostatic self-assembly of a multilayer of polyelectrolytes (poly-(diallyldimethylammonium chloride) (PDDA, MW 2,00,000-3,50,000, Aldrich), poly(sodium 4-styrenesulphonate) (PSS, MW 70,000, Aldrich) and aluminium chloride hydroxide (ACH, Reheis)).…”
Section: Colloidal Lithographymentioning
confidence: 99%
“…Several methods have been successfully used to generate nano‐ and microstructures: electron beam lithography,38 colloidal lithography,39–41 polymer demixing,42, 43 and injection molding of polymers in precast shims 44, 45. Even though these methods can result in well‐defined structures, they are difficult to be applied for structuring implant surfaces with complex geometries 31.…”
Section: Introductionmentioning
confidence: 99%