Nanoclusters and nanotubes for swift ion track technology

Abstract

With interest rising recently in nanostructures of all kinds, attention was also given to etched ion tracks in insulators. The emerging nanopores with a very high aspect ratio enable one to create new functionalities, especially in thin polymeric foils and oxide-on-silicon structures, when combined with electronic, optical, catalytic or sensing materials.These materials are often inserted into the nanopores in the form of nanoparticles for several reasons. On the one hand, quantum effects can easily be exploited in this way, and, on the other hand, tailoring of size and distance of (semi)conducting nanoclusters enables one to obtain any desired conductivity value between insulating and metallic nanocluster/nanopore devices. Also, the very large surface areas of nanoclustered materials may be useful for initiating chemical reactions, e.g. for sensing, catalytic, or medical purposes. Nanotubes may be grown within the nanopores, which enhance the range of possibilities greatly. Potential applications of these strategies are outlined.

Tunable nanoporous silicon oxide templates by swift heavy ion tracks technology

“…So far, extensive research has been already carried out to investigate the potential of this methodology for the creation of templates consisting of the a-SiO 2 porous layer on Si [49][50][51][52][53][54][55][56][57][58][59][60][61][62]. Still, systematic investigations have not been reported yet.…”

Thermal CVD Synthesis of Carbon Nanotubes in Swift Heavy Ion Tracks of Silicon Dioxide

“…At present a strong tendency is observed to use the swift heavy ion (SHI) track technology for creation of various devices for micro-and nanoelectronics. To create an ion track, being a narrow zone with altered physical and chemical properties, one needs to apply a beam of SHIs, with energy in the MeV to GeV range [1][2][3][4] to a suitable material. Further, by means of the chemical etching of latent tracks, pores of various forms and dimensions (typically 10-1000 nm) depending on irradiation parameters, etching conditions and substrate type, are formed.…”