Nano-Fluidic Millimeter-Wave Lab-on-a-Waveguide Sensor for Liquid-Mixture Characterization

Chudpooti, Nonchanutt; Silavwe, Evans; Akkaraekthalin, Prayoot; Robertson, I.D.; Somjit, Nutapong

doi:10.1109/jsen.2017.2772348

Cited by 38 publications

(26 citation statements)

References 24 publications

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“…Except for dielectric properties measurement, it is also meaningful to realize the quantification of a given binary liquid mixture [ 38 , 39 ]. Taking the acetone/water mixtures as an example, Figure 16 plots the volume fraction of water as a function of resonance frequency.…”

Section: Fabrication and Measurementmentioning

confidence: 99%

A High-Sensitivity Microfluidic Sensor Based on a Substrate Integrated Waveguide Re-Entrant Cavity for Complex Permittivity Measurement of Liquids

Wei

Huang

et al. 2018

Sensors

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In this study, a novel non-invasive and contactless microwave sensor using a square substrate integrated waveguide (SIW) re-entrant cavity is proposed for complex permittivity measurement of chemical solutions. The working principle of this sensor is based on cavity perturbation technique, in which the resonant properties of cavity are utilized as signatures to extract the dielectric information of liquid under test (LUT). A winding microfluidic channel is designed and embedded in the gap region of the cavity to obtain a strong interaction between the induced electric field and LUT, thus achieving a high sensitivity. Also, a mathematical predictive model which quantitatively associates the resonant properties of the sensor with the dielectric constant of LUT is developed through numerical analysis. Using this predictive model, quick and accurate extraction of the complex permittivity of LUT can be easily realized. The performance of this sensor is then experimentally validated by four pure chemicals (hexane, ethyl acetate, DMSO and water) together with a set of acetone/water mixtures in various concentrations. Experimental results demonstrate that the designed sensor is capable of characterizing the complex permittivities of various liquids with an accuracy of higher than 96.76% (compared with the theoretical values obtained by Debye relaxation equations), and it is also available for quantifying the concentration ratio of a given binary mixture.

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Section: Fabrication and Measurementmentioning

confidence: 99%

A High-Sensitivity Microfluidic Sensor Based on a Substrate Integrated Waveguide Re-Entrant Cavity for Complex Permittivity Measurement of Liquids

Wei

Huang

et al. 2018

Sensors

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“…The short-circuited termination is inserted to one port on the sensor that the distance between this termination and the CSRR is kept at g/4. regarding the tailor-made WR10 waveguide fabrication can be found in [3]- [4]. Complete assembly of the sensor is shown in Fig.…”

Section: Fabrication and Integration Structurementioning

confidence: 99%

96-GHz Complementary Split Ring Resonator for Thin Photoresist Film Thickness Characterization

Chudpooti

Akkaraekthalin

et al. 2019

2019 Research, Invention, and Innovation Congress (RI2C)

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Non-destructive thickness measurement offers a valuable feature for thin polymer-based applications in both industrial and medical utilization. Herein, we developed a novel, non-destructive, millimetre-wave WR-10 waveguide sensor for measuring a dielectric film layer on a transparent substrate. Complementary split-ring resonator (CSRR) was integrated on top of a customized WR10 waveguide and operated at 96 GHz. The thickness of the SU-8 layers, ranging from 3-13 m, coated on a glass substrate was then examined using the resonant frequency shift. The thickness values obtained from this novel sensor strongly resemble the values obtained from standard surface profiler measurement method, with less than 5 % difference. Thus, our novel design offers a comparable accuracy with a better cost effectiveness when compare with an existing commercial instrument.

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“…The flange holders, which are mounted on one end of the sensor, were fabricated from a smaller copper block. More information regarding the tailor-made WR10 waveguide fabrication can be found in [8].…”

Section: Fabrication and Integrationmentioning

confidence: 99%

Non-Invasive Millimeter-Wave Profiler for Surface Height Measurement of Photoresist Films

et al. 2018

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-This work presents a low-cost non-invasive millimeter-wave surface-height measurement sensor of dielectric and polymer films on glass and quartz substrates. The surfaceheight profiler utilizes near-field resonance measurement technique operating at 96 GHz implemented by using a single complementary split-ring resonator (CSRR) integrated with a tailor-made WR10 rectangular waveguide. By placing a glass or quartz substrate uniformly coated with SU-8 photoresist on top of the CSRR, the thickness of the SU-8 polymer can be extracted based on the reflected and transmitted electromagnetic-wave energy interacting at the electrical boundary between the substrate and polymer film. Uniform single layers of SU-8 polymer with thicknesses from 3 to 13 m, coated on top of glass substrate are measured and characterized. The extracted polymer-film thicknesses from the sensor in this work show an agreement of higher than 95% as compared to the commercial surface profiler instrument, while offering various advantages e.g. non-invasion, ease of measurement setup, low-cost and miniaturization.Index Terms-non-invasive measurement, millimeter-wave sensor, thickness characterization, SU-8 photoresist, W-band.

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Nano-Fluidic Millimeter-Wave Lab-on-a-Waveguide Sensor for Liquid-Mixture Characterization

Cited by 38 publications

References 24 publications

A High-Sensitivity Microfluidic Sensor Based on a Substrate Integrated Waveguide Re-Entrant Cavity for Complex Permittivity Measurement of Liquids

A High-Sensitivity Microfluidic Sensor Based on a Substrate Integrated Waveguide Re-Entrant Cavity for Complex Permittivity Measurement of Liquids

96-GHz Complementary Split Ring Resonator for Thin Photoresist Film Thickness Characterization

Non-Invasive Millimeter-Wave Profiler for Surface Height Measurement of Photoresist Films

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