Nano- and Microlens Arrays Grown Using Atomic-Layer Deposition

Wang, J.J.; Nikolov, Anguel; Wu, Qihong

doi:10.1109/lpt.2006.887775

Cited by 10 publications

(8 citation statements)

References 18 publications

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“…[1][2][3] Hence, experimental and theoretical methods have been developed to measure the nanoroughness of liquid surface. X-ray scattering and optical techniques are common experimental methods for observing the structure of a liquid surface.…”

Section: Introductionmentioning

confidence: 99%

Fluid interfacial nanoroughness measurement through the morphological characteristics of graphene

et al. 2014

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The interfacial nanoroughness of liquid plays an important role in the reliability of liquid lenses, capillary waves, and mass transfer in biological cells [Grilli et al., Opt. Express 16, 8084 (2008), Wang et al., IEEE Photon. Technol. Lett. 18, 2650), and T. Fukuma et al., 92, 3603 (2007]. However, the nanoroughness of liquid is hard to visualize or measure due to the instability and dynamics of the liquid-gas interface. In this study, we blanket a liquid water surface with monolayer graphene to project the nanoroughness of the liquid surface. Monolayer graphene can project the surface roughness because of the extremely high flexibility attributed to its one atomic thickness. The interface of graphene and water is successfully mimicked by the molecular dynamics method. The nanoroughness of graphene and water is defined based on density distribution. The correlation among the roughness of graphene and water is developed within a certain temperature range (298-390 K). The results show that the roughness of water surface is successfully transferred to graphene surface. Surface tension is also calculated with a simple water slab. The rise of temperature increased the roughness and decreased the surface tension. Finally, the relationship between graphene roughness and surface tension is fitted with a secondorder polynomial equation. V C 2014 AIP Publishing LLC.

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Section: Introductionmentioning

confidence: 99%

Fluid interfacial nanoroughness measurement through the morphological characteristics of graphene

et al. 2014

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“…The wavelength position and quality of the mode can be tuned by adjusting the thickness and dielectric properties of the defect layer during the multilayer stack ALD. ALD technology can also be used for making optical micrometer and even nanometer‐ sized lens arrays with 100% fill factor, as shown in Figure c . This ALD technology offers a degree of freedom to choose lens materials with a broad range of optical refractive indexes, as well as in controlling the curvature of the lens surface and the fill factor of the lens array for broad applications .…”

Section: Development Of Ald In the Field Of Optical Microcavitiesmentioning

confidence: 99%

“…ALD technology can also be used for making optical micrometer and even nanometer‐ sized lens arrays with 100% fill factor, as shown in Figure c . This ALD technology offers a degree of freedom to choose lens materials with a broad range of optical refractive indexes, as well as in controlling the curvature of the lens surface and the fill factor of the lens array for broad applications . Layer‐by‐layer 3D photonic crystals are fabricated by ALD of a TiO 2 coating on a large size (4 mm × 4 mm) polymer template created by soft lithography (Fig.…”

Section: Development Of Ald In the Field Of Optical Microcavitiesmentioning

confidence: 99%

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Modification and Resonance Tuning of Optical Microcavities by Atomic Layer Deposition

Wang

Huang

Mei

2014

Chemical Vapor Deposition

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Recently, enormous interest has been focused on the nanofabrication of optical micro-and nanocavities for applications in labon-a-chip and quantum optics. At the same time, the atomic layer deposition (ALD) process presents several advantages for the fabrication and modification of micro-and nanostructures because of its atomic level thickness fine-tuning and perfect coating conformability in three-dimensional (3D) structures. Hence, ALD technology has been directed into the field of optical microcavities for the tracking and tuning of their properties. In this short review, we will summarize recent progress in the application of ALD on optical microcavities. Firstly, we will briefly introduce ALD technology and emphasize its distinctive features when applied to optical microcavities. Then, various microcavities such as photonic crystals, opals, and tubular microcavities will be illustrated to demonstrate their development with the assistance of ALD technology. Such an influential manufacturing tool for optical devices could inspire numerous interesting applications, as concluded in the final part.

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“…This effect has already been utilized to grow microlens arrays [14] and planarized optical gratings [15] and to tune photonic crystal waveguides [7,16]. The conformal film also reduces surface roughness, and ALD-grown Al 2 O 3 and TiO 2 films have been found to significantly reduce propagation losses in silicon strip and slot waveguides [13,17].…”

Section: Atomic Layer Depositionmentioning

confidence: 99%

Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities

et al. 2012

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In this work we study the effect of thin-film deposition on the quality factor (Q) of silicon nanobeam cavities. We observe an average increase in the Q of 38 31% in one sample and investigate the dependence of this increase on the initial nanobeam hole sizes. We note that this process can be used to modify cavities that have larger than optimal hole sizes following fabrication. Additionally, the technique allows the tuning of the cavity mode wavelength and the incorporation of new materials, without significantly degrading Q.

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Nano- and Microlens Arrays Grown Using Atomic-Layer Deposition

Cited by 10 publications

References 18 publications

Fluid interfacial nanoroughness measurement through the morphological characteristics of graphene

Fluid interfacial nanoroughness measurement through the morphological characteristics of graphene

Modification and Resonance Tuning of Optical Microcavities by Atomic Layer Deposition

Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities

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