Multiplexed mass spectrometry for real-time sensing in a spatially programmable chemical vapor deposition reactor

Abstract

Articles you may be interested inIn situ chemical sensing in Al Ga N ∕ Ga N metal organic chemical vapor deposition process for precision film thickness metrology and real-time advanced process control J. Vac. Sci. Technol. B 23, 2007 (2005 10.1116/1.2037707 In situ chemical sensing in Al Ga N ∕ Ga N high electron mobility transistor metalorganic chemical vapor deposition process for real-time prediction of product crystal quality and advanced process control J. Vac. Sci. Technol. B 23, 1386 (2005 10.1116/1.1993616 Real-time growth rate metrology for a tungsten chemical vapor deposition process by acoustic sensing Real-time process sensing and metrology in amorphous and selective area silicon plasma enhanced chemical vapor deposition using in situ mass spectrometry Mass spectrometry has proven valuable in understanding and controlling chemical processes used in semiconductor fabrication. Given the complexity of spatial distributions of fluid flow, thermal, and chemical parameters in such processes, multipoint chemical sampling would be beneficial. The authors have designed and implemented a multiplexed mass spectrometric gas sampling system for real-time, in situ measurement of gas species concentrations at multiple locations in a spatially programmable chemical vapor deposition ͑SP-CVD͒ reactor prototype, where such chemical sensing is essential to achieve the benefits of a new paradigm for reactor design. The spatially programmable reactor, in which across-wafer distributions of reactant are programmable, enables ͑1͒ uniformity at any desired process design point, or ͑2͒ intentional nonuniformity to accelerate process optimization through combinatorial methods. The application of multiplexed mass spectrometric sensing is well suited to our SP-CVD design, which is unique in effectively segmenting the showerhead gas flows by using exhaust gas pumping through the showerhead for each segment. In turn, mass spectrometric sampling signals for each segment are multiplexed to obtain real-time signatures of reactor spatial behavior. Here the authors report results using inert gases to study the spatial distributions of species, validate SP-CVD reactor models, and lead to an understanding of fundamental phenomena associated with the reactor design. This forms the basis for using real-time mass spectrometry to drive process sensing, metrology, and control in such reactor systems.

Demonstration of spatially programmable chemical vapor deposition: Model-based uniformity∕nonuniformity control

“…These gradients could be quantified using spatial sensing capabilities ͑for example, using a mass spectrometer in a multiplexing mode where it samples different areas of the wafer in situ 7,8 ͒ and could be translated though well defined models into surface properties such as thickness, microstructure, or specific electrical properties. Combinatorial materials research would be one such capability.…”

Combinatorial Characterization of TiO2 Chemical Vapor Deposition Utilizing Titanium Isopropoxide

“…To analyze the growth process, it is necessary to correlate the obtained growth rates and properties with the actual growth conditions, that is, with local distribution of precursor flow on the substrate. For low pressure CVD systems, a segmented precursor delivery system allows the performance of combinatorial experiments while keeping the precursor flow within the different segments controlled. , However, for this approach, relatively complex simulations are necessary to determine the actual flow conditions within each segment and correlate precursor flow and growth rates or functional properties.…”

“…For low pressure CVD systems, a segmented precursor delivery system allows the performance of combinatorial experiments while keeping the precursor flow within the different segments controlled. 8,9 However, for this approach, relatively complex simulations are necessary to determine the actual flow conditions within each segment and correlate precursor flow and growth rates or functional properties.…”