2009
DOI: 10.1117/12.808469
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Multiple functional UV devices based on III-Nitride quantum wells for biological warfare agent detection

Abstract: We have demonstrated surface normal detecting/filtering/emitting multiple functional ultraviolet (UV) optoelectronic devices based on InGaN/GaN, InGaN/AlGaN and Al x Ga 1-x N/Al y Ga 1-y N multiple quantum well (MQW) structures with operation wavelengths ranging from 270 nm to 450 nm. Utilizing MQW structure as device active layer offers a flexibility to tune its long cut-off wavelength in a wide UV range from solar-blind to visible by adjusting the well width, well composition and barrier height. Similarly, i… Show more

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Cited by 9 publications
(4 citation statements)
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“…Rapid progress in III-N (nitride) material growth and device fabrication has enabled demonstration of UV light-emitting diodes with emission from 200 nm to 400 nm [1][2][3] and highefficiency visible-blind and solar-blind photodetectors [4,5] for commercial and military applications. Since the application area of the III-nitride devices is steadily spreading, several new commercial devices such as UV-LED and high-frequency high-power electronic devices begin to be available.…”
Section: Introductionmentioning
confidence: 99%
“…Rapid progress in III-N (nitride) material growth and device fabrication has enabled demonstration of UV light-emitting diodes with emission from 200 nm to 400 nm [1][2][3] and highefficiency visible-blind and solar-blind photodetectors [4,5] for commercial and military applications. Since the application area of the III-nitride devices is steadily spreading, several new commercial devices such as UV-LED and high-frequency high-power electronic devices begin to be available.…”
Section: Introductionmentioning
confidence: 99%
“…In this section we describe and discuss two MOE integration examples onto the optoelectronic devices using the microlens concept, one device is the quantum dot infrared photodetector (QDIP) [8], and another one is the GaN-based quantum well UV detector/emitter dual functional device [9]. The substrate of the QDIP is GaAs, its thickness is 350 µm or 525 µm as using 2'' or 4'' substrate, respectively.…”
Section: Applications and Prospectsmentioning
confidence: 99%
“…III-nitride based materials have attracted attention due to their excellent physical, electrical, and optical properties, and their high chemical and thermal stability as compared to traditional III-V semiconductors. The UV capabilities of III-nitride materials are of special interest for civilian applications such as air and water sterilization, efficient white lighting, high density optical data storage and military applications such as biological agent detection and non-line-of-sight communication [1][2][3][4], etc.…”
Section: Introductionmentioning
confidence: 99%