2019
DOI: 10.1016/j.matdes.2018.107549
|View full text |Cite
|
Sign up to set email alerts
|

Multifold improvement of thermoelectric power factor by tuning bismuth and antimony in nanostructured n-type bismuth antimony telluride thin films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
15
0

Year Published

2019
2019
2021
2021

Publication Types

Select...
9

Relationship

1
8

Authors

Journals

citations
Cited by 62 publications
(15 citation statements)
references
References 33 publications
0
15
0
Order By: Relevance
“…The dominant MFPs of phonons are typically an order of magnitude larger than those of electrons, thus phonon transport suffers more in the presence of nanostructuring. Some of the best results in terms of ZT improvements, however, were achieved in cases where care was taken to avoid power factor reduction [4,17,[36][37][38][39][40][41][42][43]. This is commonly achieved in two ways, either by: (i) aligning the band edges of the nanoinclusions with those of the pristine material to keep the electronic conductivity high, or (ii) going towards the reverse direction, by introducing energy barriers that result in energy filtering and improve the Seebeck coefficient.…”
Section: Introductionmentioning
confidence: 99%
“…The dominant MFPs of phonons are typically an order of magnitude larger than those of electrons, thus phonon transport suffers more in the presence of nanostructuring. Some of the best results in terms of ZT improvements, however, were achieved in cases where care was taken to avoid power factor reduction [4,17,[36][37][38][39][40][41][42][43]. This is commonly achieved in two ways, either by: (i) aligning the band edges of the nanoinclusions with those of the pristine material to keep the electronic conductivity high, or (ii) going towards the reverse direction, by introducing energy barriers that result in energy filtering and improve the Seebeck coefficient.…”
Section: Introductionmentioning
confidence: 99%
“…The films were annealed in a quartz tube flushed with argon gas, which was placed inside a 1 kW furnace. 28 CuI goes through a phase transition at 275 °C. Therefore, the annealing temperature was varied between 100 and 250 °C for 30 min.…”
Section: Methodsmentioning
confidence: 99%
“…It has been fabricated by various laboratory techniques, such as pulsed laser deposition (3), molecular beam epitaxy (4), chemical vapour deposition (5,6), electro-deposition (7), (co-)evaporation (8)(9)(10), and (co-)sputtering deposition (11,12). Sputtering and evaporation techniques show the most promising potential for scale-up to fabricate flexible electronics due to their dominance in industry, e.g.…”
Section: Introductionmentioning
confidence: 99%