“…These methods play a significant part in electronics and optoelectronics and are prevalent in industrial and scientific areas [14][15][16][17]. The controlling factor of performance is the surface condition of the substrate.…”
Abstract. Due to a number of excellent electrical and optical properties highly oriented pyrolitic graphite (HOPG) is an attractive material to use for preparation of nanostructures. It has recommended itself as a calibration material for the methods of scanning probe microscopy. This study describes the mechanically processed surfaces of graphite for further use as substrates for depositing of thin films of semiconductor materials.
“…These methods play a significant part in electronics and optoelectronics and are prevalent in industrial and scientific areas [14][15][16][17]. The controlling factor of performance is the surface condition of the substrate.…”
Abstract. Due to a number of excellent electrical and optical properties highly oriented pyrolitic graphite (HOPG) is an attractive material to use for preparation of nanostructures. It has recommended itself as a calibration material for the methods of scanning probe microscopy. This study describes the mechanically processed surfaces of graphite for further use as substrates for depositing of thin films of semiconductor materials.
“…Given the complex surface topography of nano-and microstructures, it cannot be completely characterized only by using the traditional Euclidean geometry; therefore, the use of fractal geometry is more convenient for surface roughness analyses of such systems [1,5,[9][10][11][12][13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…In this regards, in modern manufacturing processes, two approaches are mainly used for the analysis of 3-D surface topography: statistical and fractal methods [1,5,[9][10][11][12][13][14][15][16]. Given the complex surface topography of nano-and microstructures, it cannot be completely characterized only by using the traditional Euclidean geometry; therefore, the use of fractal geometry is more convenient for surface roughness analyses of such systems [1,5,[9][10][11][12][13][14][15][16].…”
In this study nickel-carbon (Ni-C) nanocomposite thin films composed of Ni nanoparticles with different average sizes embedded in amorphous hydrogenated carbon, were prepared through the combination of radio frequency sputtering and plasma enhanced chemical vapor deposition techniques. Such samples were used as experimental models to study the three dimensional surface morphology properties in thin films by atomic force microscopy imaging and fractal analysis over square areas of 1 μm 9 1 μm. The deposition time was varied at 7, 10 and 13 min, respectively, to study changes in the properties of the obtained films. The studied samples exhibited fractal properties characterized by fractal dimensions dependent on the deposition time with values between 2.43 ± 0.01 and 2.71 ± 0.01.
“…The 3-D surface topography of thin films is proven to possess only a statistical self-similarity, which takes place only in the restricted range of the spatial scales when maintaining the characteristics of continuity, non-differentiability and selfsimilarity of the structure [18,[31][32][33].…”
Section: Multifractal Analysis Of the 3-d Surface Texturementioning
The study presents a multi-scale microstructural characterization of three-dimensional (3-D) micro-textured surface of titanium nitride (TiN) thin films prepared by reactive DC magnetron sputtering in correlation with substrate temperature variation. Topographical characterization of the surfaces, obtained by atomic force microscopy (AFM) analysis, was realized by an innovative multifractal method which may be applied for AFM data. The surface micromorphology demonstrates that the multifractal geometry of TiN thin films can be characterized at nanometer scale by the generalized dimensions D q and the singularity spectrum f(α). Furthermore, to improve the 3-D surface characterization according with ISO 25178-2:2012, the most relevant 3-D surface roughness parameters were calculated. To quantify the 3-D nanostructure surface of TiN thin films a multifractal approach was developed and validated, which can be used for the characterization of topographical changes due to the substrate temperature variation.
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