2021 33rd International Symposium on Power Semiconductor Devices and ICs (ISPSD) 2021
DOI: 10.23919/ispsd50666.2021.9452235
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Monolithic Integration of Lateral HV Power MOSFET with LV CMOS for SiC Power IC Technology

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Cited by 22 publications
(4 citation statements)
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“…Owing to the wide bandgap of SiC, the sensor is inherently “solar blind” and the sensitive spectral bandwidth of the UV detector is much narrower than the Si-based UV detector, which makes this device attractive for flame detection, healthcare, etc. In addition, monolithic SiC power ICs, which consist of a high-voltage SiC power MOSFET and SiC CMOS logic circuits, have recently been demonstrated [ 53 , 54 , 56 , 57 ].…”
Section: Resultsmentioning
confidence: 99%
“…Owing to the wide bandgap of SiC, the sensor is inherently “solar blind” and the sensitive spectral bandwidth of the UV detector is much narrower than the Si-based UV detector, which makes this device attractive for flame detection, healthcare, etc. In addition, monolithic SiC power ICs, which consist of a high-voltage SiC power MOSFET and SiC CMOS logic circuits, have recently been demonstrated [ 53 , 54 , 56 , 57 ].…”
Section: Resultsmentioning
confidence: 99%
“…[13] Although better for integration, the lateral structure has certain drawbacks such as a more complex design and a higher on resistance which is detrimental to the e ciency of the converter. [12] A lateral structure also has a higher footprint than a vertical structure. The P + isolation also allows multiple devices together on the same die without sharing a common drain which further enables power converter design with two or more power switches.…”
Section: Overview Of the New Sic Technologymentioning
confidence: 99%
“…SPICE models have been developed for circuit simulation based on device measurement and characterization and are based on Level 2 parameters and this technology offers three metal layers in layout to accommodate complex designs where at least one of those three layers is used to route high-voltage signals. [12]…”
Section: Overview Of the New Sic Technologymentioning
confidence: 99%
“…The devices were fabricated by Analog Devices, Inc. (ADI) fabrication facility in Hillview, San Jose, CA, using the same base process line [19] [20]. A 10 µm thick drift layer with Ntype doping concentration of 8×10 15 cm −3 on 6-inch, N+ 4H-SiC substrate was used for the fabrication of proposed 1.2 kV MOSFETs.…”
Section: Device Fabrication Technologymentioning
confidence: 99%