Mold cleaning with polydimethylsiloxane for nanoimprint lithography

Abstract

We present a simple and effective mold cleaning method for nanoimprint lithography. Polydimethylsiloxane (PDMS) prepolymer is spin-coated onto a contaminated imprint mold, thermally cured in an ambient environment, and then peeled off afterwards. Contaminants of 100 s μm to sub-50 nm sizes are effectively cleaned within one cycle. During the cleaning process, a very thin PDMS film (1-2 nm) is uniformly coated onto the mold surface, serving as a protection and anti-sticking layer.

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“…It has some advantages over conventional methods (e.g., lithography and etching) in productivity, resolution, and cost. [227] This technique includes heating a mold and polymer sheet to glass transition temperature (T g ) of the polymer, pressing a mold into the polymer to emboss the mold pattern into the polymer at the constant T g temperature, and reducing the temperature for demolding. [228] Soft lithography is another useful technique to create micro and nanofabrication on surfaces using elastomeric materials.…”