Modified TiAlN coatings prepared by d.c. pulsed magnetron sputtering

Effect of HPPMS Pulse-Frequency on Plasma Discharge and Deposited AlTiN Coating Properties

“…This is confirmed by comparing the coating structure with published results from Obrosov et al [10]. Such a dense featureless, feathery coating structure is typical for coatings deposited with pulsed magnetron sputtering as, for example, Keunecke et al [48] and Jílek Jr. et al [49] have shown. The bombardment and inclusion of droplets, as shown in Figure 7(b), induced growth disturbances and structure disorders during coating deposition.…”

Structure and mechanical properties of (TiVCr)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios

“…They found that the high hardness (37 GPa) of the as-deposited TiAlN coating can be retained for annealing temperature up to 600 • C, and the high hardness (35 GPa) of the CrAlN coating is maintained up for an annealing temperature of 800 • C [6]. Keunecke et al and Ding et al also reported the formation of super hard TiAlN (41.6 GPa) and CrAlN (40 GPa) films, respectively [7,8]. These results clearly show that TiN or CrN coatings alloyed with Al have significantly enhanced hardness and thermal stability [9][10][11][12].…”

Oxidation resistance and characterization of (AlCrMoTaTi)-Six-N coating deposited via magnetron sputtering

“…In particular, significant amount of efforts have been devoted to decreasing the temperature at which hard coatings are formed and improving the properties of these coatings to increase their hardness and oxidation resistance. Ternary Ti-Al-N [2,3] and Ti-Si-N [4,5] systems with higher hardness values and oxidation resistances than their TiN binary counterparts have been developed.…”

“…Ternary Ti-Al-N [2,3] and Ti-Si-N [4,5] systems with higher hardness and oxidation resistance values than those of their TiN binary counterparts have been developed.…”