Modeling the plasma kinetics in a kinetically enhanced copper vapor laser utilizing HCl+H/sub 2/ admixtures

Carman, Robert J.; Mildren, Richard P.; Withford, Michael J.; Brown, Daniel J.; Piper, James A.

doi:10.1109/3.831019

Cited by 22 publications

(5 citation statements)

References 45 publications

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“…A Pyrex glass sleeve 80 mm OD × 1 mm wall was used to inhibit transient current flow between the HT electrode and the stainlesssteel chamber walls. The pulsed power supply, delivering ∼1 µs risetime, high-voltage pulses at kilohertz repetition frequencies, was a thyratron switched exciter circuit with three-stage magnetic pulse compression, previously used to drive a high-power copper vapour laser [28]. Sinusoidal (ac) voltage waveforms were generated by a signal generator and Acoustics Research AR700A RF power amplifier driving a 20 : 1 step-up transformer.…”

Section: Methodsmentioning

confidence: 99%

Enhanced performance of an EUV light source (λ = 84 nm) using short-pulse excitation of a windowless dielectric barrier discharge in neon

Carman¹,

Kane²,

Ward³

2009

J. Phys. D: Appl. Phys.

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The electrical and optical characteristics of a dielectric barrier discharge (DBD) based neon excimer lamp generating output in the extreme ultraviolet (EUV) spectral range (λ = 84 nm) have been investigated experimentally. We report a detailed comparison of lamp performance for both pulsed and sinusoidal voltage excitation waveforms, using otherwise identical operating conditions. The results show that pulsed voltage excitation yields a ∼50% increase in the overall electrical to EUV conversion efficiency compared with sinusoidal waveforms, when operating in the pressure range 500–900 mbar. Pulsed operation allows greater control of parameters associated with the temporal evolution of the EUV pulse shapes (risetime, instantaneous peak power). The Ne DBD based source is also found to be highly monochromatic with respect to its spectral output from the second continuum band at λ ∼ 84 nm (5 nm FWHM). This continuum band dominates the spectral emission over the wavelength range 30–550 nm. Lamp performance; as measured by the overall EUV output energy, electrical to EUV conversion efficiency and spectral purity at λ ∼ 84 nm; improves with increasing gas pressure up to p = 900 mbar.

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Section: Methodsmentioning

confidence: 99%

Enhanced performance of an EUV light source (λ = 84 nm) using short-pulse excitation of a windowless dielectric barrier discharge in neon

Carman¹,

Kane²,

Ward³

2009

J. Phys. D: Appl. Phys.

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“…The relevant cross sections and rate constants were obtained from Refs. [10][11][12][13][14][15][16][17][18][19][20][21]. The simulation results were determined by a set of boundary parameters including the geometrical dimension of the discharge tube, the parameters of the optical cavity, the neon buffer gas pressure, the reservoir and tube wall temperatures, and the parameters of the excitation circuit, of which the typical values were given in Ref.…”

Section: Description Of Kinetic Modelmentioning

confidence: 99%

Kinetic analysis of the factors limiting the output power of the Ne–CuBr UV laser

Mao

Pan

et al. 2009

Chinese Phys. B

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“…Such a possible direct mechanism is the de-excitation of Cu metastables to the ground-state involving H . Since it is energetically favorable for the mutual neutralization process to leave Cu atoms in the excited levels [28] which rapidly relax to the metastable states by radiative decay, the metastable states form a "bottle neck" for the relaxing Cu species. The electron collisional deactivation, which is the main mechanism for de-excitation in conventional copper vapor lasers, is not so prevalent in the Cu HyBrID discharge due to the reduced free electron density.…”

Section: By Increasing For Fixedmentioning

confidence: 99%

Cu HyBrID laser kinetics: optimization of HBr partial pressure and buffer-gas flow rate

Mildren

2003

IEEE J. Quantum Electron.

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A detailed investigation into the dependence of the densities of the principal plasma species in the laser discharge on the buffer-gas operating parameters is reported. Simple expressions for the densities of the Cu, Br, and H species are derived by considering their major mechanisms for production and loss. These predict that the atomic Cu and Br densities are proportional to the HBr mass flow rate, whereas the density of H species (i.e., H and H 2) is proportional to the added HBr partial pressure. The theory agrees well with "Hook" method measurements of Cu density in a 25-mm bore diameter device; the Cu density increases approximately in proportion to the HBr mass flow rate, whereas it depends only weakly on the HBr partial pressure. Measurements of the fraction of Cu atoms excited by the discharge pulse, the rate of regrowth of the ground-state Cu density during the inter-pulse period, and the pre-pulse plasma impedance, are also explained in accordance with the theory. The results show that the plasma conditions for maximum laser output, which are remarkably similar to those of other "halogen enhanced" Cu lasers, can be achieved more directly by adjusting the overall buffer flow rate with the partial pressure of the added HBr fixed at 1-2 mbar. The theory is also useful for predicting optimum buffer-gas conditions for a wide range of Cu HyBrID laser dimensions and operating conditions.

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Modeling the plasma kinetics in a kinetically enhanced copper vapor laser utilizing HCl+H/sub 2/ admixtures

Cited by 22 publications

References 45 publications

Enhanced performance of an EUV light source (λ = 84 nm) using short-pulse excitation of a windowless dielectric barrier discharge in neon

Enhanced performance of an EUV light source (λ = 84 nm) using short-pulse excitation of a windowless dielectric barrier discharge in neon

Kinetic analysis of the factors limiting the output power of the Ne–CuBr UV laser

Cu HyBrID laser kinetics: optimization of HBr partial pressure and buffer-gas flow rate

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