Modeling and analysis of hydrogen–methane plasma in electron cyclotron resonance chemical vapor deposition of diamond-like carbon

Yoon, Sukho; Tan, Kang Hai; Rusli, Rusli; Ahn, J.

doi:10.1063/1.1421038

Cited by 30 publications

(14 citation statements)

References 21 publications

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“…The distance l el between both electrodes is l el = 60 mm. The plasma is mainly generated in the assumed cylinder with the volume V = πr 2 el l el between the two electrodes. Fig.…”

Section: Methodsmentioning

confidence: 99%

Ion chemistry in H2-Ar low temperature plasmas

Sode

Schwarz-Selinger

Jacob

2013

Journal of Applied Physics

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A rate equation model is devised to study the ion composition of inductively coupled H 2 -Ar plasmas with different H 2 -Ar mixing ratios. The model is applied to calculate the ion densities n i , the wall loss probability of atomic hydrogen β H , and the electron temperature T e . The calculated n i 's of Ar + , H + , H + 2 , H + 3 and ArH + are compared with experimental results. Calculations were made for a total gas pressure of 1.0 Pa. The production and loss channels of all ions are presented and discussed in detail. With the production and loss rates the density dependence of each ion on the plasma parameters are explained. It is shown that the primary ions H + 2 and Ar + which are produced by ionization of the background gas by electron collisions are effectively converted into H + 3 and ArH + . The high density of ArH + and Ar + is attributed to the low loss to the walls compared to hydrogen ions. It is shown that the H + /H + 2 density ratio is strongly correlated to the H/H 2 density ratio. The dissociation degree is around 1.7 %. From matching the calculated to the measured atomic hydrogen density n H the wall loss probability of atomic hydrogen on stainless steel β H was determined to be β H = 0.24. The model results were compared with recently published experimental results. The calculated and experimentally obtained data are in fair agreement.

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“…The distance l el between both electrodes is l el = 60 mm. The plasma is mainly generated in the assumed cylinder with the volume V = πr 2 el l el between the two electrodes. Fig.…”

Section: Methodsmentioning

confidence: 99%

Ion chemistry in H2-Ar low temperature plasmas

Sode

Schwarz-Selinger

Jacob

2013

Journal of Applied Physics

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“…They are usually deposited by PECVD 1, 2,4 or electron cyclotron resonance ͑ECR͒ or reactive sputtering at moderate bias voltage. [5][6][7] ͑3͒ Hydrogenated tetrahedral amorphous carbon films ͑ta-C:H͒. ta-C:H films are a class of DLCH in which the CC sp 3 content can be increased while keeping a fixed H content, as in Fig.…”

Section: Introductionmentioning

confidence: 99%

Raman spectroscopy of hydrogenated amorphous carbons

2005

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We present a comprehensive multiwavelength Raman investigation of a variety of hydrogenated amorphous carbons ͑a-C:H͒, ranging from polymeric a-C : H to diamond-like a-C : H and ta-C:H, which allows us to derive values for their bonding, density, band gap, hydrogen content, and mechanical properties. The Raman spectra of a-C : Hs show two different trends. In one case, the G peak width increases with G peak dispersion. In the second case, the opposite trend is found. In the first case, the Raman parameters vary with optical, structural, and mechanical properties in the same way as in hydrogen-free carbon films. In the second case, typical of polymeric a-C:H, the G peak width correlates with the density, while the G peak dispersion varies with the optical gap and hydrogen content. This allows a unified picture of bonding and disorder of all carbon films. UV Raman is particularly useful for a-C : Hs, as it gives clear measurements in the D and G peaks spectral region even for highly hydrogenated samples, for which the visible Raman spectra are overshadowed by photoluminescence. On the other hand, the slope of the photoluminescence background in visible Raman spectra can be used to estimate the H content. UV Raman measurements also allow the detection of C u H stretching vibrations.

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“…25,26 There- fore, it is more likely for reactive C-containing species such as CH x ͑x =1-3͒ radicals to participate in bonding related to a-CN x at increasing rf power. 25,26 There- fore, it is more likely for reactive C-containing species such as CH x ͑x =1-3͒ radicals to participate in bonding related to a-CN x at increasing rf power.…”

Section: Resultsmentioning

confidence: 99%