Heterogeneous integration of multijunction III-V solar cells on Si is a promising solution for the widespread commercialization of III-V cells. However, the polar on non-polar epitaxy and 4% lattice-mismatch between GaAs and Si results in formation of defects and dislocations, which can significantly impede the minority carrier lifetime and hence the cell performance. We have investigated the impact of threading dislocation density on the performance of dual-junction (2J) n+/p InGaP/GaAs solar cells on Si. Using our calibrated model, the metamorphic 2J cell on Si was optimized by tailoring the 2J cell design on Si to achieve current-matching between the subcells at a realistic threading dislocation density of 10 6 cm -2 . We present a novel 2J InGaP/GaAs cell design on Si at a threading dislocation density of 10 6 cm -2 which exhibited a theoretical conversion efficiency of greater than 29% at AM1.5G spectrum, indicating a path for viable III-V multijunction cell technology on Si.Index Terms -III-V semiconductor materials, charge carrier lifetime, epitaxial layers, photovoltaic cells, semiconductor device modeling, short circuit currents, silicon.