Metastable structures in magnetron sputtered W–Zr thin-film alloys

Červená, Michaela; Čerstvý, R.; Dvorák, Tomáš; Rezek, J.; Zeman, Petr

doi:10.1016/j.jallcom.2021.161558

Cited by 8 publications

(1 citation statement)

References 34 publications

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“…This unusual metastability has been attributed to the cohesivity afforded by strong metal-nitrogen bonds in the solid-state, which can kinetically 'lock-in' metastable nitride structures. Furthermore, thin-film fabrication is known as a synthesis technique remarkably capable of working out of the equilibrium state and thus stabilizing such a metastable nitride 25 . Consequently, in this study, the magnetron sputtering technique from V and W targets under Ar/N 2 atmosphere was used to study the formation of ternary nitride films with an ultimate goal to reach the expected VWN 3 phase.…”

Section: Introductionmentioning

confidence: 99%

Wafer-Scale Performance Mapping of Magnetron-Sputtered Ternary Vanadium Tungsten Nitride for Microsupercapacitors

Dinh,

Robert,

Thuriot-Roukos

et al. 2023

Chem. Mater.

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To power Internet-of-Things applications, new materials are currently being investigated as efficient electrodes for microsupercapacitors. In recent years, multicationic materials were demonstrated to be an attractive new class of materials for electrodes. In this study, we deposited vanadium tungsten nitride by cosputtering. Our film shows excellent electrochemical performance, a capacitance of 700 F•cm −3 , and no loss in capacitance retention after 5000 cycles. In addition, the properties of the film were investigated in many aspects using advanced characterization and mapping techniques. Our approach opens new perspectives and provides a powerful characterization tool for electrochemical materials.

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Section: Introductionmentioning

confidence: 99%