Abstract:We present a study of a transition metal oxide composite modified n-Si photoanode for efficient and stable water oxidation. This sputter-coated composite functions as a protective coating to prevent Si from photodecomposition, a Schottky heterojunction, a hole conducting layer for efficient charge separation and transportation, and an electrocatalyst to reduce the reaction overpotential. The formation of mixed-valence oxides composed of Ni and Ru effectively modifies the optical, electrical, and catalytic prop… Show more
“…0.1 %a t6 40 nm (Figure 7a), accompanied by a5 0% increase of OER photocurrent at 12.3 Vv ersus RHE in an eutral electrolyte (pH 7.2) under AM1.5G (Figure 7b). [23] Forw ater reduction, photolithographically prepared Si micropillars also showed enhanced HER photocurrent density from 8to9mA cm À2 at 0Vversus RHE (1m HClO 4 ,A M1.5G with l > 635 nm) compared to planar p-Si(100) electrodes. [12] Similarly,both InP nanopillars (Figure 7c) [20] and InP nanowire arrays (Figure 7d) [5] were demonstrated to suppress the reflectance of polished planar InP from ca.…”
Section: Surface Texturizationmentioning
confidence: 94%
“…[23] Upon the incorporation of RuO x ,the Ni II /Ni III ratio changed from 0.86 to 0.35 as revealed by XPS,indicating that the NiRuO x film was Ni III -rich. By depositing this NiRuO x film on FTO, the dark OER overpotentials at 10 mA cm À2 decreased from 1829 (bare FTO) to 797 mV versus RHE (pH 7.2), which outperformed the pure NiO x film that needed a1 043 mV overpotential to drive the same current density.F or the n-Si/NiRuO x photoanode under AM1.5G illumination, an onset potential of 1.08 Vv ersus RHE (pH 7.2) was observed, with ap hotocurrent density of 0.94 mA cm À2 at 1.23 Vv ersus RHE.…”
Section: Noble Metals As Oer Cocatalystsmentioning
confidence: 97%
“…[23] Although transparent conductive oxides (TCOs) such as indium tin oxide (ITO) or fluorine-doped tin oxide (FTO) could protect the substrate against corrosion to some extent under neutral or mild pH conditions, [24] limited success with modified TCO has been reported for high pH solutions. [25] Ti films were also shown to enable Si to withstand the OER conditions or the oxidizing preparation procedures of cocatalyst, but the metallic nature of Ti makes it compete with the semiconductor for light absorption.…”
Section: Surface Protection For Photoanodesmentioning
Solar water splitting provides a clean and renewable approach to produce hydrogen energy. In recent years, single-crystal semiconductors such as Si and InP with narrow band gaps have demonstrated excellent performance to drive the half reactions of water splitting through visible light due to their suitable band gaps and low bulk recombination. This Minireview describes recent research advances that successfully overcome the primary obstacles in using these semiconductors as photoelectrodes, including photocorrosion, sluggish reaction kinetics, low photovoltage, and unfavorable planar substrate surface. Surface modification strategies, such as surface protection, cocatalyst loading, surface energetics tuning, and surface texturization are highlighted as the solutions.
“…0.1 %a t6 40 nm (Figure 7a), accompanied by a5 0% increase of OER photocurrent at 12.3 Vv ersus RHE in an eutral electrolyte (pH 7.2) under AM1.5G (Figure 7b). [23] Forw ater reduction, photolithographically prepared Si micropillars also showed enhanced HER photocurrent density from 8to9mA cm À2 at 0Vversus RHE (1m HClO 4 ,A M1.5G with l > 635 nm) compared to planar p-Si(100) electrodes. [12] Similarly,both InP nanopillars (Figure 7c) [20] and InP nanowire arrays (Figure 7d) [5] were demonstrated to suppress the reflectance of polished planar InP from ca.…”
Section: Surface Texturizationmentioning
confidence: 94%
“…[23] Upon the incorporation of RuO x ,the Ni II /Ni III ratio changed from 0.86 to 0.35 as revealed by XPS,indicating that the NiRuO x film was Ni III -rich. By depositing this NiRuO x film on FTO, the dark OER overpotentials at 10 mA cm À2 decreased from 1829 (bare FTO) to 797 mV versus RHE (pH 7.2), which outperformed the pure NiO x film that needed a1 043 mV overpotential to drive the same current density.F or the n-Si/NiRuO x photoanode under AM1.5G illumination, an onset potential of 1.08 Vv ersus RHE (pH 7.2) was observed, with ap hotocurrent density of 0.94 mA cm À2 at 1.23 Vv ersus RHE.…”
Section: Noble Metals As Oer Cocatalystsmentioning
confidence: 97%
“…[23] Although transparent conductive oxides (TCOs) such as indium tin oxide (ITO) or fluorine-doped tin oxide (FTO) could protect the substrate against corrosion to some extent under neutral or mild pH conditions, [24] limited success with modified TCO has been reported for high pH solutions. [25] Ti films were also shown to enable Si to withstand the OER conditions or the oxidizing preparation procedures of cocatalyst, but the metallic nature of Ti makes it compete with the semiconductor for light absorption.…”
Section: Surface Protection For Photoanodesmentioning
Solar water splitting provides a clean and renewable approach to produce hydrogen energy. In recent years, single-crystal semiconductors such as Si and InP with narrow band gaps have demonstrated excellent performance to drive the half reactions of water splitting through visible light due to their suitable band gaps and low bulk recombination. This Minireview describes recent research advances that successfully overcome the primary obstacles in using these semiconductors as photoelectrodes, including photocorrosion, sluggish reaction kinetics, low photovoltage, and unfavorable planar substrate surface. Surface modification strategies, such as surface protection, cocatalyst loading, surface energetics tuning, and surface texturization are highlighted as the solutions.
“…Previous studies confirmed long-term stable water splitting on nanostructured InGaN/GaN photoanodes in 1 M NaOH electrolyte with photocurrent densities in the sub-mA/cm 2 range under AM1.5G one sun illumination. 26,51 By developing an effective protection strategy to prevent the oxidation of the underlying Si substrates, 52 InGaN nanowire photoanodes integrated on Si have the potential to enable high efficiency and highly stable solar water splitting. Moreover, heterostructures based on such superior quality InGaN nanowires also hold tremendous promise for realizing deep visible and near-infrared light emitting diodes and lasers on a Si platform for full color displays and on-chip optical communications.…”
III-nitride semiconductors hold tremendous promise for realizing high efficiency photoelectrodes. However, previously reported InGaN photoelectrodes generally exhibit very low photocurrent densities, due to the presence of extensive defects, dislocations, and indium phase separation. Here, we show that In0.5Ga0.5N nanowires with nearly homogeneous indium distribution can be achieved by plasma-assisted molecular beam epitaxy. Under AM1.5G one sun illumination, the InGaN nanowire photoanode exhibits a photocurrent density of 7.3 mA/cm2 at 1.2 V (vs. NHE) in 1M HBr. The incident-photon-to-current efficiency is above 10% at 650 nm, which is significantly higher than previously reported values of metal oxide photoelectrodes.
“…Mn [62], Fe [63], Ni [26,[64][65][66][67][68][69][70] and Ir [71], have been used to protect n-Si photoanodes for water oxidation in strongly alkaline or acidic electrolytes [72]. Protection of III-V and II-VI semiconductors in aqueous photoelectrochemical systems has also been studied.…”
Small-band-gap (E g < 2 eV) semiconductors must be stabilized for use in integrated devices that convert solar energy into the bonding energy of a reduced fuel, specifically H 2 (g) or a reduced-carbon species such as CH 3 OH or CH 4 . To sustainably and scalably complete the fuel cycle, electrons must be liberated through the oxidation of water to O 2 (g). Strongly acidic or strongly alkaline electrolytes are needed to enable efficient and intrinsically safe operation of a full solar-driven water-splitting system. However, under water-oxidation conditions, the smallband-gap semiconductors required for efficient cell operation are unstable, either dissolving or forming insulating surface oxides. We describe herein recent progress in the protection of semiconductor photoanodes under such operational conditions. We specifically describe the properties of two protective overlayers, TiO 2 /Ni and NiO x , both of which have demonstrated the ability to protect otherwise unstable semiconductors for >100 h of continuous solar-driven water oxidation when in contact with a highly alkaline aqueous electrolyte (1.0 M KOH(aq)). The 2 stabilization of various semiconductor photoanodes is reviewed in the context of the electronic characteristics and a mechanistic analysis of the TiO 2 films, along with a discussion of the optical, catalytic, and electronic nature of NiO x films for stabilization of semiconductor photoanodes for water oxidation.
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