Metal ALD and pulsed CVD: Fundamental reactions and links with solution chemistry

Emslie, David J. H.; Chadha, Preeti; Price, Jeffrey S.

doi:10.1016/j.ccr.2013.07.010

Cited by 64 publications

(65 citation statements)

References 171 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…29,[32][33][34][35] Here, deposition occurs in cyclic manner; the overall deposition cycle using two initial reactants involves four consecutive pulses of precursor vapors, purge gas, second reactant and purge gas again. In some cases, more complicated designs are used, which involve intermediate evacuation of the reaction chamber.…”

Section: 31mentioning

confidence: 99%

Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

et al. 2015

View full text Add to dashboard Cite

show abstract

Section: 31mentioning

confidence: 99%

Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

et al. 2015

View full text Add to dashboard Cite

show abstract

“…ALD is advantageous because it gives extremely conformal and uniform coatings [31,32]. (True) ALD is based on the alternating reactions of gas phase species at a surface that generally deposit rather small quantities of material with each step.…”

Section: Introductionmentioning

confidence: 99%

Atomic layer deposition of aluminum-free silica onto patterned carbon nanotube forests in the preparation of microfabricated thin-layer chromatography plates

Kanyal¹,

Jensen²,

Dadson³

et al. 2014

Journal of Planar Chromatography – Modern TLC

View full text Add to dashboard Cite

SummaryWe describe the direct, conformal, atomic layer deposition (ALD) of silica onto carbon nanotubes (CNTs) in the microfabrication of thinlayer chromatography (TLC) plates. As before, these plates were prepared with zig-zag hedge and channel microstructures, with high aspect ratio, porous hedges. After ALD, scanning electron microscopy (SEM) showed an increase in the radius of the CNTs of 8-40 nm. X-ray photoelectron spectroscopy (XPS) showed that the plates were composed almost entirely of silicon and oxygen, without contamination of metals or other elements that might compromise chromatographic performance, e.g., aluminum. Time-of-flight secondary ion mass spectrometry confirmed the extremely low level of aluminum in the plates. The final TLC layer thickness was ca. 50 μm. Separations of a test mixture of dyes from CAMAG (Muttenz, Switzerland) on an uncoated silica plate under traditional, normal phase conditions gave efficiencies of 40,000-140,000 plates m −1 with migration distances ranging from 2 to 36 mm. A separation of two fluorescent dyes, eosin Y disodium salt and sulforhodamine B, on an amino silane-coated plate gave efficiencies of ca. 170,000 and 200,000 plates m −1 , with hR F values of 76 and 88, respectively. Run times on these new plates were much faster than on conventional TLC plates.

show abstract

“…Atomic layer deposition (ALD) is a method based on successive, alternating surface-controlled reactions from the gas phase to produce highly conformal and uniform thin film nanostructures, and provides the thickness control at the atomic level [25,26]. The structure growth principle by ALD is similar to the CVD, except the ALD reaction breaks the CVD process into two half-reactions, keeping the precursor materials separate during the reaction.…”

Section: Atomic Layer Depositionmentioning

confidence: 99%

“…Next, the second precursor is purged and reacts with the first precursor on the surface. At the end of the process, the unused second precursor and the reaction byproducts are also removed [25,26]. The precursors for the ALD can be solid, liquid, and gaseous.…”

Section: Atomic Layer Depositionmentioning

confidence: 99%

See 1 more Smart Citation

ZnO Quasi-1D Nanostructures: Synthesis, Modeling, and Properties for Applications in Conductometric Chemical Sensors

2016

View full text Add to dashboard Cite

Abstract:One-dimensional metal oxide nanostructures such as nanowires, nanorods, nanotubes, and nanobelts gained great attention for applications in sensing devices. ZnO is one of the most studied oxides for sensing applications due to its unique physical and chemical properties. In this paper, we provide a review of the recent research activities focused on the synthesis and sensing properties of pure, doped, and functionalized ZnO quasi-one dimensional nanostructures. We describe the development prospects in the preparation methods and modifications of the surface structure of ZnO, and discuss its sensing mechanism. Next, we analyze the sensing properties of ZnO quasi-one dimensional nanostructures, and summarize perspectives concerning future research on their synthesis and applications in conductometric sensing devices.

show abstract

Metal ALD and pulsed CVD: Fundamental reactions and links with solution chemistry

Cited by 64 publications

References 171 publications

Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

Atomic layer deposition of aluminum-free silica onto patterned carbon nanotube forests in the preparation of microfabricated thin-layer chromatography plates

ZnO Quasi-1D Nanostructures: Synthesis, Modeling, and Properties for Applications in Conductometric Chemical Sensors

Contact Info

Product

Resources

About