Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

Abstract

Iridium-based film precursor chemistry, nucleation and growth at CVD/ALD are reviewed with numerical characterization of the growth features in 3D objects.

The dependence of oxygen sensitivity on the molecular structures of Ir(iii) complexes and their application for photostable and reversible luminescent oxygen sensing

“…6 Such type of exible approach depends on the dynamic (diffusion-controlled) luminescence (phosphorescence or uorescence) quenching of oxygen-sensitive probes (OSPs). 7,8 The transition metal complexes are OSPs of choice, including Ir(III), [9][10][11][12] Pt(II), 13,14 Ru(II) 15,16 complexes, and Pd(II) porphyrins. 17,18 In general, the oxygen sensitivities of luminescence sensors are roughly proportional to luminescent decay times (s) of OSPs.…”

Volatile iridium(I) complexes with β-diketones and cyclooctadiene: syntheses, structures and thermal properties

“…Among the methods of film material formation, Metal-Organic Chemical Vapor Deposition (MOCVD) and its modifications (Atomic Layer Deposition and others) are preferable techniques to obtain refractory coatings such as Ir or IrO 2 with required characteristics [7]. In the case of noble metal coatings, it is especially important that MOCVD is characterized by the high utilization of initial compound (precursor).…”

“…Recently, mixed-ligand mononuclear complexes of iridium(I) have caused growing interest because of high volatility and relatively easy synthesis [7]. So, the present work deals with the investigation of influence of the ligand on the structure and thermal properties of mixedligand complexes of iridium(I) [Ir(cod) were varied to explore the influence of steric effect and terminal substituent types (alkyl, aryl, fluorinated alkyl) as follows: R 1 = R 2 = Me (acac), t Bu (thd), CF 3 (hfac); R 1 = CF 3 , R 2 = Me (tfac); t Bu (ptac), Ph (btfac).…”

Chemistry of gold(I, III) complexes with organic ligands as potential MOCVD precursors for fabrication of thin metallic films and nanoparticles

“…The development of MOCVD methods and chemistry of precursor for deposition of Ir, Ru, Rh, Pd, Pt, Os coatings have been the subject of several reviews [46][47][48][49][50][51][52][53], however reviews summarizing data on chemistry of gold complexes with organic ligands as precursors for deposition of Au films and nanoparticles are only sporadic and were written more than 10 years ago. A review article written by A. Grodzicki in 2005 [54] was devoted to gold(I) carboxylates and its complexes with tertiary phosphines as a new class of CVD precursors.…”