2008
DOI: 10.1109/tnano.2008.2005492
|View full text |Cite
|
Sign up to set email alerts
|

MESFETs Made From Individual GaN Nanowires

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

1
33
1

Year Published

2010
2010
2021
2021

Publication Types

Select...
10

Relationship

1
9

Authors

Journals

citations
Cited by 70 publications
(35 citation statements)
references
References 28 publications
1
33
1
Order By: Relevance
“…Dielectrophoresis has been previously demonstrated [3,23] as a means of integrating nanowires to microfabricated structures in a wafer-level assembly technique. This method is less time-consuming than using micromanipulators to place individual nanowires.…”
Section: Nanowire Placementmentioning
confidence: 99%
“…Dielectrophoresis has been previously demonstrated [3,23] as a means of integrating nanowires to microfabricated structures in a wafer-level assembly technique. This method is less time-consuming than using micromanipulators to place individual nanowires.…”
Section: Nanowire Placementmentioning
confidence: 99%
“…Recently, rapid progress has been found in the fabrication of GaN-based optoelectronic and microelectronic devices such as GaN-based light-emitting diodes [LEDs] [1], laser diodes [LDs] [2], Solar-blind MSM-photodetectors [3], metal-semiconductor field effect transistor [MESFETs] [4], modulation-doped field effect transistor [MODFETs] [5], heterostructure field effect transistors [HFETs] [6] and high electron mobility transistors [HEMTs] [7,8]. Especially, the performance and reliability of these devices have been improved with high quality ohmic and Schottky rectifiers.…”
Section: Introductionmentioning
confidence: 99%
“…Examples of such effects have previously been reported in both transient and steady-state experiments involving photoconductivity (PC), photoluminescence (PL), the behavior of NW field-effect transistors (FETs), and NW gas sensors. [11][12][13][14][15][16][17][18][19] In the present work, we study transport properties, surface effects, and transient FET behavior as revealed by PC, backgated FETs, and top-gated MESFETs. All devices were fabricated from c-axis GaN NWs grown by nitrogen-plasmaassisted molecular beam epitaxy (MBE).…”
mentioning
confidence: 99%