2013
DOI: 10.1063/1.4789369
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Mechanisms of droplet formation and Bi incorporation during molecular beam epitaxy of GaAsBi

Abstract: We have examined the mechanisms of droplet formation and Bi incorporation during molecular beam epitaxy of GaAsBi. We consider the role of the transition from group-V-rich to group-III-rich conditions, i.e., the stoichiometry threshold, in the presence of Bi. For As-rich GaAsBi growth, Bi acts as a surfactant, leading to the formation of droplet-free GaAsBi films. For films within 10% of the stoichiometric GaAsBi growth regime, surface Ga droplets are observed. However, for Ga-rich GaAsBi growth, Bi acts as an… Show more

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Cited by 75 publications
(60 citation statements)
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“…The theoretical model using Monte Carlo simulation to analyze the Ga droplet formation on GaAs surface was discussed in reference [126]. Experiment in reference [127] confirmed that the Ga-Bi droplets coexist under a Ga-rich growth regime of GaAsBi. Further selective etching process also confirms that the surface droplets often include Ga as well as Bi.…”
Section: Bi Dropletsmentioning
confidence: 95%
“…The theoretical model using Monte Carlo simulation to analyze the Ga droplet formation on GaAs surface was discussed in reference [126]. Experiment in reference [127] confirmed that the Ga-Bi droplets coexist under a Ga-rich growth regime of GaAsBi. Further selective etching process also confirms that the surface droplets often include Ga as well as Bi.…”
Section: Bi Dropletsmentioning
confidence: 95%
“…A relatively large Bi flux was used, twice that of As, while maintaining an approximately equal flux of As and Ga. This places the growth conditions well within the Bi saturation regime, 10 where an alloying limit is imposed by the low miscibility of Bi into GaAs. As a consequence, liquid Bi droplets form ( Fig.…”
Section: Methodsmentioning
confidence: 99%
“…1(a) shows a representative scanning electron micrograph (SEM) of the GaAsBi sample surface, revealing a relatively smooth GaAsBi epitaxial growth overgrown by metallic surface droplets and the formation of in-plane nanotracks. EDS measurements indicated pure Bi droplets are formed on the GaAsBi surface (no final Ga/Bi dual composites 10 ), which is indicative of Bi-rich growth and attributed to Bi segregation. 10 The bottom inset in Fig.…”
mentioning
confidence: 99%
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“…Bi serves as a surfactant to enable a smooth growth of the subsequent GaAs growth, as well as GaAsBi growth. [17][18][19] Surplus Bi that segregates at the surface is undesirable and hinders the growth of uniform GaAsBi layers. 20 This relative low crystal quality will seriously facilitate the high J th value, especially for the very low temperature growth of the GaAs barrier layers in the QW structure.…”
Section: Fig 2 Depicts Both Voltage-current (V-imentioning
confidence: 99%