Our system is currently under heavy load due to increased usage. We're actively working on upgrades to improve performance. Thank you for your patience.
2015
DOI: 10.1002/adma.201404579
|View full text |Cite
|
Sign up to set email alerts
|

Mechanisms for Hydrolysis of Silicon Nanomembranes as Used in Bioresorbable Electronics

Abstract: Systematic experimental and theoretical studies of the hydrolysis of silicon nano­membranes at near‐neutral pH conditions reveal the roles of anion concentration and temperature. An empirical model captures the dependence of the dissolution rates on key factors, and atomic‐level simulations provide insights into the underlying chemistry.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

7
109
0

Year Published

2015
2015
2022
2022

Publication Types

Select...
5
4

Relationship

2
7

Authors

Journals

citations
Cited by 101 publications
(135 citation statements)
references
References 48 publications
7
109
0
Order By: Relevance
“…The w2 remains as OH − for an additional 3 ns and forms a water molecule by bonding with another H + at t = 31 ns. The conversion of SiðOHÞ 2+ 2 → SiðOHÞ 4 finishes at 80-90 ns at T = 37°C, such that the final product of dissolution is silicic acid, similar to findings from previous studies of dissolution of bulk Si using comparable models (49). These reaction products appear within the 35-ns timescale of the simulations presented here under accelerated conditions, that is, at 100°C, SiðOHÞ Fig.…”
Section: Chemical and Physical Effects In Electrical Leakage Through supporting
confidence: 85%
“…The w2 remains as OH − for an additional 3 ns and forms a water molecule by bonding with another H + at t = 31 ns. The conversion of SiðOHÞ 2+ 2 → SiðOHÞ 4 finishes at 80-90 ns at T = 37°C, such that the final product of dissolution is silicic acid, similar to findings from previous studies of dissolution of bulk Si using comparable models (49). These reaction products appear within the 35-ns timescale of the simulations presented here under accelerated conditions, that is, at 100°C, SiðOHÞ Fig.…”
Section: Chemical and Physical Effects In Electrical Leakage Through supporting
confidence: 85%
“…2,29,30 This same equation does not fully describe the results reported here, as summarized in Figure S2a in the SI and Table 1 and in previous dissolution studies of mono-Si. 2 …”
Section: Resultsmentioning
confidence: 65%
“…We note that the concentrations of ions such as Cl − and PO 4 3− likely influence the values of E A and k 0 , as for the case of mono-Si. 29 The values of R for poly-Si, a-Si, SiGe, and Ge are 2.8, 4.1, 0.1, and 3.1 nm/day, respectively, in buffer solutions at pH 7.4 and 37°C. Poly-Si dissolves at a rate similar to that observed for mono-Si (2.9 nm/day), while a-Si and Ge dissolve somewhat more quickly.…”
Section: Resultsmentioning
confidence: 96%
“…According to previous studies, the dissolution rate of monolayer MoS 2 or Si nanomembranes increases with increasing PBS temperature 20,47 . In view of the dissolution kinetics of monolayer MoS 2 (~200 nm grain size) in PBS solution, a high concentration, pH, or temperature results in a high dissolution speed 20 .…”
Section: Resultsmentioning
confidence: 68%