Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings

Chang, Li-Chun; Liu, Bowei; Chen, Yung-I

doi:10.3390/coatings8100354

Cited by 11 publications

(4 citation statements)

References 41 publications

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“…ZrBSiTa and (ZrBSiTa)N x films were fabricated on silicon wafers through cosputtering. The cosputtering apparatus has been described in a previous study [31]. The targetsubstrate distance was 90 mm.…”

Section: Methodsmentioning

confidence: 99%

Characterization of ZrBSiTaNx Films

Yeh,

Chang,

Chen

2024

Coatings

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In this study, ZrBSiTa and (ZrBSiTa)Nx films were deposited on silicon wafers through direct current magnetron cosputtering. The nitrogen flow ratio (RN2) of the reactive gas and the sputter power applied to the Si target (PSi) were the variables in the fabricating processes. The influence of the N and Si contents on the mechanical properties, thermal stability, and oxidation behavior of the ZrBSiTa and (ZrBSiTa)Nx films were investigated. All the as-fabricated films exhibited amorphous structures. The RN2 set at 0.1, 0.2, and 0.4 caused the ZrBSiTaNx films to exhibit high N contents of 52–55, 62–64, and 63–64 at.%, respectively. The Si content of the ZrBSiTa films increased from 0 to 42 at.% as PSi increased from 0 to 150 W, and this was accompanied by decreases in hardness and Young’s modulus values from 19.1 to 14.3 GPa and 264 to 242 GPa, respectively. In contrast, the increase in Si content of the (ZrBSiTa)Nx films from 0 to 21 at.% increased the hardness from 11.5 to 14.0 GPa, and Young’s modulus from 207 to 218 GPa. Amorphous BN and SiNx phases in the (ZrBSiTa)Nx films varied the structural and mechanical properties. The thermal stability of the (ZrBSiTa)Nx films was evaluated by annealing at 800–900 °C for 10–30 min in Ar. The oxidation behavior of the (ZrBSiTa)Nx films was evaluated in the ambient air at 800 °C for 0.5–24 h. The amorphous (ZrBSiTa)Nx films with a high Si content had high thermal stability and oxidation resistance.

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Section: Methodsmentioning

confidence: 99%

Characterization of ZrBSiTaNx Films

Yeh,

Chang,

Chen

2024

Coatings

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“…The samples prepared on the two kinds of substrate were fabricated in one batch. The sputtering equipment and processes were similar to those used for fabricating Hf-Si-N/Ti/Si assemblies, which were described in detail in a previous study [33]. Targets of 99.95% pure Cr and 99.999% Si with a diameter of 50.8 mm were adopted as source materials.…”

Section: Methodsmentioning

confidence: 99%

“…The Poisson's ratio used was 0.24 for CrN [35]. The residual stress of the coatings was measured by the curvature method using Stoney's equation [33,36]. A scratch test (Scratch Tester, J & L Tech.…”

Section: Methodsmentioning

confidence: 99%

Mechanical Properties and Oxidation Behavior of Cr–Si–N Coatings

2019

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Cr–Si–N coatings were prepared through reactive direct current magneton sputtering using a high N2/Ar flow ratio of 1. The addition of Si to improve the mechanical properties and oxidation resistance of Cr–N coatings was examined. The results indicated that the Cr–Si–N coatings with an Si content of <12 at % and an N content of >50 at % exhibited a cubic CrN phase with a columnar structure, whereas the coatings with 14 at % Si comprised of a nanocomposite structure, and the coatings with 16–18 at % Si were near-amorphous. The nanocomposite Cr32Si14N54 coating possessed hardness and Young’s modulus values of 17 and 209 GPa, respectively, accompanied with a hardness to effective Young’s modulus (H/E*) value of 0.077 and an elastic recovery (We) level of 55%—all the properties were highest within the as-deposited coating. The addition of Si was also beneficial to reduce the surface roughness and improve the oxidation resistance.

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“…The ability to form a self-lubricating layer of molybdenum oxide during wear tests has made Mo-N a promising coating system for tribological application [14][15][16][17][18][19]. Moreover, the incorporation of Si in TMN films generally leads to the formation of nanocomposite TM-Si-N films, in which TMN nanocrystalline grains are solid-solution strengthened or are surrounded by an amorphous Si 3 N 4 phase [19][20][21][22][23][24][25][26][27][28], and better characteristics are realized subsequently. For example, Lin et al produced Cr-Si-N nanocomposite films by a closed field unbalanced magnetron sputtering system with Cr and Si dual targets [20].…”

Section: Introductionmentioning

confidence: 99%

Microstructure Evolution and Mechanical Behavior of Mo–Si–N Films

et al. 2020

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The molybdenum silicon nitride (Mo–Si–N) films were deposited by a radio frequency (RF) magnetron reactive dual-gun co-sputtering technique with process control on input power and gas ratio. Composition variation, microstructure evolution, and related mechanical and tribological behavior of the Mo–Si–N coatings were investigated. The N2/(Ar + N2) flow ratios were controlled at 10/20 and 5/20 levels with the tuning of input power on the Si target at 0, 100, and 150 W. As the silicon contents increased from 0 to 33.7 at.%, the film microstructure evolved from a crystalline structure with Mo2N and MoN phases to an amorphous feature with the Si3N4 phase. The analysis of selected area electron diffraction patterns in TEM also indicated an amorphous feature of the Mo–Si–N films when Si content reached 20 at.% and beyond. The hardness and Young’s modulus changed from 16.5 to 26.9 and 208 to 273 GPa according to their microstructure features. The highest hardness and modulus were attributed to nanocrystalline Mo2N and MoN with Si solid-solution. The crystalline Mo–Si–N films showed a smooth tribological track and less wear failure was found. In contrast, the wear track with severe failures were observed for Mo–N and amorphous Mo–Si–N coatings due to their lower hardness. The ratios of H/E and H3/E2 were intensively discussed and correlated to the wear behavior of the Mo–Si–N coatings.

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Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings

Cited by 11 publications

References 41 publications

Characterization of ZrBSiTaNx Films

Characterization of ZrBSiTaNx Films

Mechanical Properties and Oxidation Behavior of Cr–Si–N Coatings

Microstructure Evolution and Mechanical Behavior of Mo–Si–N Films

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