2022
DOI: 10.1016/j.ijleo.2021.168404
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Mechanic properties modification of SiO2 thin films by femtosecond laser

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Cited by 6 publications
(4 citation statements)
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“…Figure shows the Raman spectra of the fabricated devices. For the Al/Ge/Sn/Ge/Sn on p -Si and n -Si substrates, there is a peak at 523 cm –1 that corresponds to the crystalline Si substrates. , A broad band at 350–520 cm –1 is detected for the prepared Al/Si/Sn/Ge/Sn on FTO, which corresponds to poly:Si formed by MIC of the deposited Si layer and the SiO 2 vibrational mode formed because of the oxidation of Si during annealing at low vacuum levels. The appearance of poly:Ge and GeSn modes at 300 cm –1 are shifted toward lower wavenumbers due to the transformation of the amorphous germanium layer to a polycrystalline one via tin-induced crystallization and the incorporation of Sn metal inside the Ge network . The signature of the GeSn mode is weak due to the strong peaks of the c:Si, corresponding to the silicon substrates.…”
Section: Resultsmentioning
confidence: 99%
“…Figure shows the Raman spectra of the fabricated devices. For the Al/Ge/Sn/Ge/Sn on p -Si and n -Si substrates, there is a peak at 523 cm –1 that corresponds to the crystalline Si substrates. , A broad band at 350–520 cm –1 is detected for the prepared Al/Si/Sn/Ge/Sn on FTO, which corresponds to poly:Si formed by MIC of the deposited Si layer and the SiO 2 vibrational mode formed because of the oxidation of Si during annealing at low vacuum levels. The appearance of poly:Ge and GeSn modes at 300 cm –1 are shifted toward lower wavenumbers due to the transformation of the amorphous germanium layer to a polycrystalline one via tin-induced crystallization and the incorporation of Sn metal inside the Ge network . The signature of the GeSn mode is weak due to the strong peaks of the c:Si, corresponding to the silicon substrates.…”
Section: Resultsmentioning
confidence: 99%
“…where h is the full depth. Nano-scratch testing was carried out with a procedure previously used in our laboratory (Lemoine et al, 2004) and similar to that employed in many other thin film studies (Banday et al, 2021;Zhi et al, 2022;Ma et al, 2021). Compared to the nanoindentation study, we used a more acute diamond cube corner tip (semi-included apex angle = 45 • ) to increase strain and trigger brittle fracture.…”
Section: Methodsmentioning
confidence: 99%
“…These effects will decrease the laser induced damage threshold (LIDT) of SiO2 thin film, therefore affect the performance of optical systems under high laser power irradiation. Many thin film modification methods have been proposed to improve the LIDT of SiO2 thin film, including thermal annealing [27], plasma treatment [28,29] and laser conditioning [30][31][32]. Among them, femtosecond laser conditioning mainly belongs to non-thermal transition [33], therefore is less likely to cause serious thermal damage to the interior of materials than nanosecond laser pulse.…”
Section: Introductionmentioning
confidence: 99%
“…Understanding the properties changes of SiO2 thin film after femtosecond laser conditioning is important to improve process of modification method. Zhi et al has investigated the mechanic properties changes of ALD SiO2 thin film after femtosecond laser modification [30]. In this article, we applied femtosecond laser to the modification of ALD SiO2 thin film on the fused silica substrates, in order to improve the laser induced damage resistance of ALD SiO2 thin film.…”
Section: Introductionmentioning
confidence: 99%