Manufacturing of large area high mobility AM-TFT backplanes using IGZO rotary sputtering targets

Abstract

IGZO deposition by rotary sputtering targets serves the needs for high-performance, low-manufacturing-cost TFTs. Both, manufacturability of rotary targets and performance of produced TFTs confirm the feasibility and underline the advantages of using rotary technology. INTRODUCTIONIt has been demonstrated that IGZO TFT backplanes can be used for advanced displays by several display manufacturers 1-3 , although many challenges are still to overcome for large scale production. One of the challenges is to make large area displays repeatedly with good TFT performance and low cost. Because of its success for deposition of high quality transparent conductive oxide layers and metallization layers on larger substrates (2500x2200mm), rotary target sputtering technology has been considered as the solution to address the challenge. In this paper, results of a systematic study, including target manufacturing, film deposition, TFT performance testing under normal and stressed conditions, are presented to demonstrate the feasibility.

Oxide TFTs: A Progress Report

“…1 is capable of producing uniform IGZO films over a 2200 × 2500 mm (Gen 8.5) substrate. The use of rotary targets improves target lifetime and production yield, reduces particle generation, and lowers manufacturing costs compared to that obtainable using planar targets 7 . (For more about this system, see the article, “A Process for Using Oxide‐TFTs over LTPS‐TFTs for Better OLED‐TV Manufacturing” in the November/December 2015 issue.…”