2005
DOI: 10.1016/j.nimb.2005.04.027
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Making porous membranes by chemical etching of heavy-ion tracks in β-PVDF films

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Cited by 47 publications
(35 citation statements)
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“…Generally, PVDF membranes are usually prepared through thermally-induced phase separation [9] or immersion precipitation [10], but other methods are also developed to prepare PVDF membranes such as sintering [11], track etching [12] and phase separation using supercritical carbon dioxide as non-solvent [13], etc. Although, PVDF membranes have already been widely used in many fields, the high hydrophobicity characteristic of PVDF membranes also limits the enlarging of application fields.…”
Section: Introductionmentioning
confidence: 99%
“…Generally, PVDF membranes are usually prepared through thermally-induced phase separation [9] or immersion precipitation [10], but other methods are also developed to prepare PVDF membranes such as sintering [11], track etching [12] and phase separation using supercritical carbon dioxide as non-solvent [13], etc. Although, PVDF membranes have already been widely used in many fields, the high hydrophobicity characteristic of PVDF membranes also limits the enlarging of application fields.…”
Section: Introductionmentioning
confidence: 99%
“…In order to produce visible tracks in irradiated PVDF films, researchers have used several kinds of etching solutions; in most cases [8,9], a concentrated aqueous potassium hydroxide (KOH) solution with a potassium permanganate (KMnO 4 ) additive was maintained at a high temperature. These severe etching conditions produced irreversible chemical damage over the entire film including the non-irradiated part.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, we have been trying to establish a preparation method of PVDF ion-track membranes (5)(6)(7). Researchers in the past employed several kinds of etching solutions to produce visible tracks in irradiated PVDF films; in most cases (8,9), a highly-concentrated aqueous potassium hydroxide (KOH) solution with a potassium permanganate (KMnO 4 ) additive was maintained at a high temperature. These severe etching conditions provided irreversible chemical damage all over the film including a non-irradiated part.…”
Section: Introductionmentioning
confidence: 99%