“…The influence of various buffer layers [11], the effects produced by electrode materials [12] and the multiple coatings of different kinds of perovskite dielectric thin films [13] were investigated for application to the high-density nonvolatile memory devices. The effects of various seeding layers on the properties of PZT and SBT thin films have also been studied [12,14,15].…”
Bi4Ti3O12 (BTO) and Bi3.25La0.75Ti3O12 (BLT) ferroelectric thin films were deposited on Pt/Si substrates by RF magnetron sputtering with Bi4Ti3O12 (BTO) and Bi3.25La0.75Ti3O12 (BLT) targets with 50-mm diameter and 5-mm thickness. The microstructure and ferroelectric properties of thin films were investigated. The grain growth behavior and ferroelectric properties such as remanent polarization were different in these two kinds of film, the effects of La doping in the BLT thin film were very obvious.
“…The influence of various buffer layers [11], the effects produced by electrode materials [12] and the multiple coatings of different kinds of perovskite dielectric thin films [13] were investigated for application to the high-density nonvolatile memory devices. The effects of various seeding layers on the properties of PZT and SBT thin films have also been studied [12,14,15].…”
Bi4Ti3O12 (BTO) and Bi3.25La0.75Ti3O12 (BLT) ferroelectric thin films were deposited on Pt/Si substrates by RF magnetron sputtering with Bi4Ti3O12 (BTO) and Bi3.25La0.75Ti3O12 (BLT) targets with 50-mm diameter and 5-mm thickness. The microstructure and ferroelectric properties of thin films were investigated. The grain growth behavior and ferroelectric properties such as remanent polarization were different in these two kinds of film, the effects of La doping in the BLT thin film were very obvious.
“…6 It has been successfully used as a buffer layer to improve the electrical properties of ferroelectric Bi 4 Ti 3 O 12 , 7,8 Na 0.5 Bi 0.5 TiO 3 , 9 PZT, 10 and PST. 11 Despite the above advantages, Bi 2 Ti 2 O 7 can be easily transformed into perovskite-type bismuth titanate phase Bi 4 Ti 3 O 12 at high temperature. 7,12 The X-ray diffraction (XRD) patterns shown that the sample is a mixed-phase structure, which includes Bi 2 Ti 2 O 7 and Bi 4 Ti 3 O 12 phases, as annealed at 600 • C for 15 min.…”
Ce-doped Bi 2 Ti 2 O 7 thin films have been successfully prepared on P-type Si substrates by a chemical solution deposition method. The structural properties of the films were studied by X-ray diffraction. The phase of Ce-doped Bi 2 Ti 2 O 7 was more stable than that of Bi 2 Ti 2 O 7 without Ce substitution. The films exhibited good insulating properties at room temperature. The dielectric constant of the films annealed at 700 • C at 100 kHz was 168 and the dissipation factor was 0.038. All these results showed that Ce-doped Bi 2 Ti 2 O 7 thin films could be used as storage capacitors in DRAM and MOS.
“…Polycrystalline thin films of composition Bi 2 Ti 2 O 7 [6] have high permittivity and low leakage current. They have been used to improve the electrical properties of Bi 4 Ti 3 O 12 [6], PZT [7] and PST [8] ferroelectric thin films and considered promising gate materials for advanced MOS transistors [9]. Recently, Yao et al [10] has reported that the crystal of Bi 2 Ti 2 O 7 can be used as photocatalyst, which exhibits higher photocatalytic activity than the Degussa P-25.…”
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